Nickel oxide thin films synthesized by reactive pulsed laser deposition: Characterization and application to hydrogen sensing

Applied Physics A: Materials Science and Processing

Volumn 91, Issue 3, 2008, Pages 487-492

  Fasaki, I ^a,b   Giannoudakos, A ^a,b   Stamataki, M ^a   Kompitsas, M ^a   Gyorgy E ^c,d   Mihailescu, I N ^d   Roubani Kalantzopoulou, F ^b   Lagoyannis, A ^e   Harissopulos, S ^e  

^a THEORETICAL AND PHYSICAL CHEMISTRY INSTITUTE   (Greece)

^b NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

^c CSIC   (Spain)

^d INSTITUTE OF ATOMIC PHYSICS   (Romania)

^e INSTITUTE OF NUCLEAR PHYSICS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; FILM GROWTH; HYDROGEN; NICKEL OXIDE; PULSED LASER DEPOSITION; SURFACE MORPHOLOGY; SYNTHESIS (CHEMICAL);

HYDROGEN SENSING; LASER SOURCES; OXYGEN DEFICIENCIES;

THIN FILMS;

EID: 42449155849     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-008-4435-0     Document Type: Article

References (26)

1. Fuel Cell Standards Committee, Basic Consideration for Safety of Hydrogen Systems, Tech. Rep. ISO TC 197 N166, International Standards Organization (2001)
2. M.S. Seehra, T.M. Giebultowicz, Phys. Rev. B 38, 11898 (1988)
3. M. Blaumer, H.J. Freund, Prog. Surf. Sci. 61, 127 (1999)
4. Z. Jiao, M. Wu, Z. Qin, H. Xu, Nanotechnology 14, 458 (2003)
5. X. Chen, N.J. Wu, L. Smith, A. Ignatiev, Appl. Phys. Lett. 84, 2700 (2004)
6. J. Shi, Y. Zhu, X. Zhang, W.R.G. Baeyens, A.M. García- Campaña, Trends Anal. Chem. 23, 1 (2004)
7. M. Ando, Y. Sato, S. Tamura, T. Kobayashi, Solid State Ionics 121, 307 (1999)
8. Y. Wang, C. Ma, X. Sun, H. Li, Micropor. Mesopor. Mater. 71, 99 (2004)
9. Z. Jiao, M. Wu, Z. Qin, H. Xu, Nanotechnology 14, 458 (2003)
10. T.G. Souza Cruz, M.U. Hleinke, A. Gorenstein, Appl. Phys. Lett. 81, 4922 (2002)
11. M. Lee, S. Seo, D. Seo, E. Jeong, I.K. Yoo, Integr. Ferroelectr. 68, 19 (2004)
12. L. Zbroniec, T. Sasaki, N. Koshizaki, J. Ceram. Process. Res. 6, 134 (2005)
13. B. Sasi, K.G. Gopchandran, Nanotechnology 18, 115613 (2007)
14. D.G. Chrisey, G.K. Hubler (eds.), Pulsed Laser Deposition of Thin Films (Wiley, New York, 1994)
15. M. Von Allmen, A. Blatter, Laser-Beam Interactions with Materials, 2nd edn. (Springer, Berlin, 1995)
16. D. Bäuerle, Laser Processing and Chemistry, 3th edn. (Springer, Berlin, 2000)
17. M. Mayer, SIMNRA, a simulation program for the analysis of NRA, RBS and ERDA, in Proc. 15th Int. Conf. Application of Accelerators in Research and Industry, ed. by J.L. Duggan, I.L. Morgan (American Institute of Physics Conf. Proc. 475) (American Institute of Physics, Melville, NY, 1999), p. 541
18. Z. Zhang, M.G. Lagally, Science 276, 377 (1997)
19. Powder Diffraction Files, JCPDS International Centre for Diffraction Data (ICDD, Newtown Square, PA, 1995)
20. Z. Iqbal, F.A. Sarott, C. Veprek, J. Phys. C 16, 2005 (1983)
21. A.D. Krawitz, Introduction to Diffraction in Materials Science and Engineering (Wiley, New York, 2001)
22. J.I. Pankove, Optical Processes in Semiconductors (Prentice-Hall, Englewood Cliffs, NJ, 1971), p. 93
23. Y. He, C. Yin, G. Chen, L. Wang, X. Liu, G.Y. Hu, J. Appl. Phys. 75, 797 (1994)
24. N. Martin, C. Rousselot, D. Rondot, F. Palmino, R. Mercier, Thin Solid Films 300, 113 (1997)
25. D. Adler, J. Feinlieb, Phys. Rev. B 2, 3112 (1970)
26. Y. Lin, T. Xie, B.C. Cheng, B.Y. Geng, L.D. Zhang, Chem. Phys. Lett. 380, 521 (2003)