Nanoliter deposition unit for pipetting droplets of small volumes for Total Reflection X-ray Fluorescence applications

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 82, Issue , 2013, Pages 71-75

  Wastl, A ^a   Stadlbauer, F ^a   Prost, J ^a   Horntrich, C ^a   Kregsamer, P ^a   Wobrauschek, P ^a   Streli, C ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Applying sample pattern; Nanoliter deposition unit; TXRF

Indexed keywords

APPLYING SAMPLE PATTERN; EXTERNAL CALIBRATION; EXTERNAL STANDARDS; FLUORESCENCE SIGNALS; NANOLITERS; SEMI-CONDUCTOR SURFACES; TOTAL REFLECTION X-RAY FLUORESCENCE; TXRF;

DROPS; FLUORESCENCE; QUARTZ;

DEPOSITION;

EID: 84875245144     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sab.2013.01.006     Document Type: Article

References (14)

1. P. Wobrauschek Total reflection X-ray fluorescence analysis - a review X-Ray Spectrom. 36 2007 289 300
2. R. Klockenkaemper Total-reflection X-ray fluorescence analysis (chemical analysis: a series of monographs on analytical chemistry and its applications) 1996 Wiley New York
3. B. Beckhoff, B. Kanngiesser, N. Langhoff, R. Wedell, and H. Wolff Handbook of practical X-ray fluorescence analysis 2006 Springer-Verlag Berlin Heidelberg
4. T. Miller, and G. Havrilla Nanodroplets: a new method for dried spot preparation and analysis X-Ray Spectrom. 33 2004 101 106
5. F. Stadlbauer, Entwicklung und Realisierung einer computergestützten Nanoliter-Applikationseinheit zur exakten Positionierung von reproduzierbaren Flüssigkeits-volumina auf Probenträger für die Totalreflexions-Röntgenfluoreszenzanalyse, Master - Thesis Vienna University of Technology, 2011.
6. C. Horntrich, P. Kregsamer, P. Wobrauschek, and C. Streli Considerations on the ideal sample shape for total reflection X-ray fluorescence analysis Spectrochim. Acta Part B 66 2011 815 821
7. C. Horntrich, P. Kregsamer, S. Smolek, A. Maderitsch, P. Wobrauschek, R. Simon, A. Nutsch, M. Knoerr, and C. Streli Influence of the excitation energy on absorption effects in total reflection X-ray fluorescence analysis J. Anal. At. Spectrom. 27 2012 340 345
8. D. Ingerle, F. Meirer, N. Zoeger, G. Pepponi, D. Giubertoni, G. Steinhauser, P. Wobrauschek, and C. Streli A new spectrometer for grazing incidence X-ray fluorescence for the characterization of arsenic implants and Hf based high-k layers Spectrochim. Acta Part B 65 2010 429 433
9. U. Fittschen, S. Hauschild, M.A. Amberger, G. Lammel, C. Streli, S. Foerster, P. Wobrauschek, C. Jokubonis, G. Pepponi, G. Falkenberg, and J.A.C. Broekaert A new technique for the deposition of standard solutions in total reflection X-ray fluorescence spectrometry (TXRF) using pico-droplets generated by inkjet printers and its applicability for aerosol analysis with SR-TXRF Spectrochim. Acta Part B 61 2006 1098 1104
10. T. Miller, E. Hastings, and G. Havrilla Automated printing technology as a new tool for liquid sample preparation for micro X-Ray fluorescence MXRF X-Ray Spectrom. 35 2006 131 136
11. T. Miller, C. Sparks, G. Havrilla, and M. Beebe Semiconductor applications of nanoliter droplet methodology with total reflection X-ray fluorescence analysis Spectrochim. Acta Part B 59 2004 1117 1124
12. C. Horntrich, P. Kregsamer, J. Prost, F. Stadlbauer, P. Wobrauschek, and C. Streli Production of the ideal sample shape for total reflection X-ray fluorescence analysis Spectrochim. Acta Part B 77 2012 31 34
13. D. Hellin, W. Fyen, J. Rip, T. Delande, P.W. Mertens, S. De Gendt, and C. Vinckier Saturation effects in TXRF on micro-droplet residue samples J. Anal. At. Spectrom. 19 2004 1517 1523
14. C. Horntrich, Characterization of the influence of the sample shape on accuracy, statistics and reproducibility in TXRF analysis of semiconductor surfaces, PhD - Thesis Vienna University of Technology, 2011.