Bond and electrochromic properties of WO3 films deposited with horizontal DC, pulsed DC, and RF sputtering

Electrochimica Acta

Volumn 93, Issue , 2013, Pages 307-313

  Chen, Hsi Chao ^a   Jan, Der Jun ^b   Chen, Chien Han ^a   Huang, Kuo Ting ^a  

^a NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b INSTITUTE OF NUCLEAR ENERGY RESEARCH   (Taiwan)

Author keywords

Cyclic voltammograms (CVs); Electrochromism; Pulsed DC sputtering; Radio frequency (RF) sputtering; Tungsten oxide (WO3)

Indexed keywords

CYCLIC VOLTAMMOGRAMS; ELECTROCHROMIC PROPERTIES; OPTICAL INTENSITIES; PULSED DC SPUTTERING; RADIO FREQUENCIES; RADIO-FREQUENCY SPUTTERING; SPUTTERING POWER; TUNGSTEN OXIDE;

ELECTROCHROMIC DEVICES; ELECTROCHROMISM; OXIDES; OXYGEN; RADIO WAVES; THIN FILMS; TUNGSTEN COMPOUNDS;

DEPOSITS;

EID: 84874901661     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2013.01.094     Document Type: Article

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