Structural and optical properties of nanocrystalline WO 3 thin films

Journal of Materials Science: Materials in Electronics

Volumn 22, Issue 9, 2011, Pages 1466-1472

  Rao, K Srinivasa ^a   Kanth, B Rajini ^b   Devi, G Srujana ^b   Mukhopadhyay, P K ^b  

^a Parvathaneni Brahmayya Siddhartha College of Arts & Science   (India)

^b S N BOSE NATIONAL CENTRE FOR BASIC SCIENCES   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CONSTANT POWER; DEPOSITED FILMS; NANOCRYSTALLINES; OPTICAL ENERGY GAP; ORTHORHOMBIC PHASE; P-TYPE SI; POST-ANNEALING TEMPERATURE; R.F. MAGNETRON SPUTTERING; SPUTTERING PRESSURES; STRUCTURAL AND OPTICAL PROPERTIES; STRUCTURAL STUDIES; TRICLINIC PHASE; UV-VIS SPECTROPHOTOMETRY; XRD; XRD SPECTRA;

ANNEALING; ATOMIC FORCE MICROSCOPY; ENERGY GAP; QUARTZ; SOLIDS; THIN FILMS;

OPTICAL PROPERTIES;

EID: 80054994252     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-011-0331-z     Document Type: Article

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