Optimization of the deposition and annealing conditions of fluorine-doped indium oxide films for silicon solar cells

Semiconductors

Volumn 47, Issue 3, 2013, Pages 415-421

  Untila, G G ^a   Kost, T N ^a   Chebotareva, A B ^a   Timofeyev, M A ^a  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

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[No Author keywords available]

Indexed keywords

EID: 84874793751     PISSN: 10637826     EISSN: None     Source Type: Journal    
DOI: 10.1134/S1063782613030275     Document Type: Article

References (24)

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