Time-resolved imaging of processes associated with exit-surface damage growth in fused silica following exposure to nanosecond laser pulses

Optics Express

Volumn 21, Issue 4, 2013, Pages 4875-4888

  Demos, Stavros G ^a   Raman, Rajesh N ^a   Negres, Raluca A ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GROWTH KINETICS;

CIRCUMFERENTIAL CRACKS; DAMAGE EVENTS; DAMAGE GROWTH; ENERGY DEPOSITIONS; LASER DAMAGE GROWTH; MATERIAL EJECTION; MATERIAL RESPONSE; MICROSCOPE SYSTEMS; NANOSECOND LASER PULSE; PLASMA FORMATIONS; PLASMA REGION; SPATIAL RESOLUTION; STRUCTURAL FEATURE; SURFACE DAMAGES; TEMPORAL RESOLUTION; TIME RESOLVED IMAGING; TIME-RESOLVED;

LASER DAMAGE;

SILICON DIOXIDE;

CHEMISTRY; HARDNESS; HEAT; LASER; MATERIALS TESTING; RADIATION DOSE; RADIATION RESPONSE; SURFACE PROPERTY; YOUNG MODULUS; ARTICLE; RADIATION EXPOSURE;

ELASTIC MODULUS; HARDNESS; HOT TEMPERATURE; LASERS; MATERIALS TESTING; RADIATION DOSAGE; SILICON DIOXIDE; SURFACE PROPERTIES;

EID: 84874540287     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.004875     Document Type: Article

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