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Volumn 35, Issue 16, 2010, Pages 2702-2704

Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL LEACHING; DEFECT LAYERS; FLUENCES; FRACTURE SURFACES; FUSED SILICA OPTICS; LASER DAMAGE INITIATION; LASER DAMAGE TESTING; MECHANICAL FLAWS; OPTICAL DAMAGE THRESHOLD; OPTICAL DAMAGES; PHOTOLUMINESCENCE MICROSCOPY; SECONDARY ELECTRONS; SILICA SURFACE; STRUCTURAL FEATURE; SUBBAND GAP ABSORPTION; VISIBLE LIGHT;

EID: 77955888802     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.35.002702     Document Type: Article
Times cited : (171)

References (15)
  • 15
    • 84893925610 scopus 로고    scopus 로고
    • T. I. Suratwala, P. E. Miller, J. D. Bude, W. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, Calif. 94550, USA, are preparing a manuscript to be called "HF-based etching processes for improving laser damage resistance of fused silica optical surfaces"
    • T. I. Suratwala, P. E. Miller, J. D. Bude, W. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, Calif. 94550, USA, are preparing a manuscript to be called "HF-based etching processes for improving laser damage resistance of fused silica optical surfaces."


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.