Stoichiometry dependence and thermal stability of conducting NdGaO 3/SrTiO3 heterointerfaces

Applied Physics Letters

Volumn 102, Issue 7, 2013, Pages

  Gunkel, F ^a   Skaja, K ^a   Shkabko, A ^a   Dittmann, R ^a   Hoffmann Eifert, S ^a   Waser, R ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AS-GROWN FILMS; CATION STOICHIOMETRY; CONDUCTANCE MEASUREMENT; CRYSTALLINITIES; DEPOSITION TEMPERATURES; ELEVATED TEMPERATURE; EQUILIBRIUM CONDITIONS; HETERO-INTERFACES; HIGH TEMPERATURE; STRUCTURAL AND ELECTRICAL PROPERTIES; THERMAL INSTABILITIES;

INTERFACES (MATERIALS); PHOTOELECTRONS; STOICHIOMETRY; STRONTIUM TITANATES; THERMODYNAMIC STABILITY; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRIC PROPERTIES;

EID: 84874514815     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4792509     Document Type: Article

References (17)

1. A. Ohtomo and H. Y. Hwang, Nature 427, 423 (2004). 10.1038/nature02308
2. N. Nakagawa, H. Hwang, and D. Muller, Nature Mater. 5, 204 (2006). 10.1038/nmat1569
3. G. Herranz, M. Basletić, M. Bibes, C. Carrétéro, E. Tafra, E. Jacquet, K. Bouzehouane, C. Deralot, A. Hamzic, J. M. Broto, Phys. Rev. Lett. 98, 216803 (2007). 10.1103/PhysRevLett.98.216803
4. W. Siemons, G. Koster, H. Yamamoto, W. A. Harrison, G. Lucovsky, T. H. Geballe, D. H. A. Blank, and M. R. Beasley, Phys. Rev. Lett. 98, 196802 (2007). 10.1103/PhysRevLett.98.196802
5. S. A. Pauli and P. R. Willmott, J. Phys. Condens. Matter 20, 264012 (2008). 10.1088/0953-8984/20/26/264012
6. F. Gunkel, P. Brinks, S. Hoffmann-Eifert, R. Dittmann, M. Huijben, J. E. Kleibeuker, G. Koster, G. Rijnders, and R. Waser, Appl. Phys. Lett. 100, 052103 (2012). 10.1063/1.3679139
7. P. Perna, D. Maccariello, M. Radovic, U. S. di Uccio, I. Pallecchi, M. Codda, D. Marre, C. Cantoni, J. Gazquez, M. Varela, Appl. Phys. Lett. 97, 152111 (2010). 10.1063/1.3496440
8. Y. Hotta, T. Susaki, and H. Y. Hwang, Phys. Rev. Lett. 99, 236805 (2007). 10.1103/PhysRevLett.99.236805
9. 3 conducting interface.," e-print arXiv:1206.5083v1 (unpublished).
10. R. Dirsyte, J. Schwarzkopf, G. Wagner, J. Lienemann, M. Busch, H. Winter, and R. Fornari, Appl. Surf. Sci. 255, 8685-8687 (2009). 10.1016/j.apsusc.2009. 06.052
11. E. Talik, A. Kruczek, H. Sakowska, Z. Ujma, M. Gala, and M. Neumann, J. Alloys Compd. 377, 259-267 (2004). 10.1016/j.jallcom.2004.01.037
12. S. Thiel, G. Hammerl, A. Schmehl, C. W. Schneider, and J. Mannhart, Science 313, 1942 (2006). 10.1126/science.1131091
13. A. Brinkman, M. Huijben, M. van Zalk, J. Huijben, U. Zeitler, J. C. Maan, W. G. van der Wiehl, G. Rijnders, D. H. A. Blank, and H. Hilgenkamp, Nature Mater. 6, 493 (2007). 10.1038/nmat1931
14. M. Reinle-Schmitt, C. Cancellieri, D. Li, D. Fontaine, M. Medarde, E. Pomjakushina, C. W. Schneider, S. Gariglio, P. Ghosez, J. M. Triscone, and P. R. Willmott, Nature Commun. 3, 932 (2012). 10.1038/ncomms1936
15. F. Gunkel, S. Hoffmann-Eifert, R. Dittmann, S. B. Mi, C. L. Jia, P. Meuffels, and R. Waser, Appl. Phys. Lett. 97, 012103 (2010). 10.1063/1.3457386
16. R. Moos and K. H. Haerdtl, J. Am. Ceram. Soc. 80, 2549 (1997).
17. T. Ishihara, H. Matsuda, M. A. bin Bustam, and Y. Takita, Solid State Ionics 86-88, Part 1, 197 (1996). 10.1111/j.1151-2916.1997.tb03157.x