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Volumn 22, Issue 47, 2012, Pages 24798-24804

Creation of nanoporous tantalum (Ta)-incorporated titanium (Ti) surface onto Ti implants by sputtering of Ta in Ar under extremely high negative substrate biases

(5) Pham, Vuong Hung a Jang, Tae Sik a Jung, Hyun Do a Kim, Hyoun Ee a Koh, Young Hag b

a Seoul National University (South Korea)

b Korea University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BIOLOGICAL PERFORMANCE; DEPOSITED FILMS; ENERGETIC ION; LARGE SURFACE AREA; LONG TERM STABILITY; MC3T3-E1; NANO-POROUS SURFACES; NANOPOROUS STRUCTURES; NANOPOROUS TANTALUM; NEGATIVE SUBSTRATES; ORTHOPEDIC IMPLANT; OSSEOINTEGRATION; RE-SPUTTERING; SURFACE MODIFICATION TECHNIQUES; TI SUBSTRATES;

DENTAL PROSTHESES; TANTALUM; TITANIUM;

SUBSTRATES;

EID: 84873174806 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c2jm35536a Document Type: Article

Times cited : (16)

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