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Volumn 527, Issue , 2013, Pages 334-337
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Electrical property relaxation characteristics of UV-treated ZnO-based thin film transistors
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Author keywords
Charge trapping; Keywords; Oxygen vacancy ionization; Secondary ion mass spectrometry; Transparent thin film transistor; Ultraviolet photoelectron spectroscopy; Ultraviolet treatment; X ray photoelectron spectroscopy; Zinc oxide
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Indexed keywords
BOTTOM GATE;
CHANNEL REGION;
DE-TRAPPING;
DEEP UV;
ELECTRICAL RESPONSE;
GATE INSULATOR;
INITIAL VALUES;
KEYWORDS;
OFF-CURRENT;
SPECTROSCOPIC CHANGES;
SUBTHRESHOLD SWING;
TRANSPARENT THIN FILM TRANSISTOR;
TRAP CENTER;
ULTRAVIOLET TREATMENT;
UV ENERGY;
UV ILLUMINATIONS;
ZNO;
CHARGE TRAPPING;
HYDROGEN;
OXYGEN VACANCIES;
PHOTOELECTRONS;
POWER QUALITY;
SECONDARY ION MASS SPECTROMETRY;
SILICON NITRIDE;
THIN FILM TRANSISTORS;
THIN FILMS;
ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY;
X RAY PHOTOELECTRON SPECTROSCOPY;
ZINC OXIDE;
ELECTRIC PROPERTIES;
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EID: 84872609186
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2012.11.057 Document Type: Article |
Times cited : (2)
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References (19)
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