SCOPUS 정보 검색 플랫폼

Volumn 527, Issue , 2013, Pages 179-185

Reversible wettability control of silicon nanowire surfaces: From superhydrophilicity to superhydrophobicity

(9) Seo, Jungmok a Lee, Soonil a Han, Heetak a Chung, Youngwon a Lee, Jaehong a Kim, Sung Dae b Kim, Young Woon b Lim, Sangwoo a Lee, Taeyoon a

a Yonsei University (South Korea)

b University of Seoul (South Korea)

Author keywords

Keywords; Metal assisted chemical etching; Si nanowire; Siloxane formation; Superhydrophobic; Water adhesive surface; Wettability conversion

Indexed keywords

ADHESIVE SURFACES; KEYWORDS; METAL-ASSISTED CHEMICAL ETCHING; SI NANOWIRE; SILOXANE FORMATION; SUPERHYDROPHOBIC;

CONTACT ANGLE; HYDROPHOBICITY; NANOWIRES; OXYGEN; RAPID THERMAL ANNEALING; WETTING;

SILICON;

EID: 84872600344 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2012.12.010 Document Type: Article

Times cited : (26)

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