Photodynamic inhibition of Trichophyton rubrum: In vitro activity and the role of oxidative and nitrosative bursts in fungal death

Journal of Antimicrobial Chemotherapy

Volumn 68, Issue 2, 2013, Pages 354-361

  Baltazar, Ludmila de Matos ^a   Soares, Betânia Maria ^a,b   Carneiro, Hellem Cristina Silva ^a   Ávila, Thiago Vinícius ^a   Gouveia, Ludmila Ferreira ^a   Souza, Danielle G ^a   Ferreira, Marcus Vinícius Lucas ^a   Pinotti, Marcos ^a   Santos, Daniel de Assis ^a   Cisalpino, Patrícia Silva ^a  

^a FEDERAL UNIVERSITY OF MINAS GERAIS   (Brazil)

^b UNIVERSIDADE DE ITAÚNA   (Brazil)

Author keywords

Antimicrobial photodynamic treatment; Cyclopiroxolamine; Dermatophytes; LED; TBO

Indexed keywords

CICLOPIROXOLAMINE; NITRIC OXIDE; PEROXYNITRITE; REACTIVE OXYGEN METABOLITE; TOLUIDINE DERIVATIVE;

ANTIFUNGAL SUSCEPTIBILITY; ANTIMICROBIAL PHOTODYNAMIC INHIBITION; ARTICLE; CONTROLLED STUDY; FUNGAL STRAIN; FUNGUS GROWTH; FUNGUS ISOLATION; GROWTH INHIBITION; IN VITRO STUDY; LIGHT EMITTING DIODE; NITROSATIVE STRESS; NONHUMAN; OXIDATIVE STRESS; PHOTODYNAMICS; QUANTITATIVE ANALYSIS; TRICHOPHYTON RUBRUM;

ANTIFUNGAL AGENTS; HUMANS; LIGHT; MICROBIAL SENSITIVITY TESTS; MICROBIAL VIABILITY; NITRIC OXIDE; PHOTOSENSITIZING AGENTS; PYRIDONES; REACTIVE OXYGEN SPECIES; TOLONIUM CHLORIDE; TRICHOPHYTON;

EID: 84872373910     PISSN: 03057453     EISSN: 14602091     Source Type: Journal    
DOI: 10.1093/jac/dks414     Document Type: Article

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