Micromanufacturing in fused silica via femtosecond laser irradiation followed by gas-phase chemical etching

Micromachines

Volumn 3, Issue 4, 2012, Pages 604-614

  Venturini, Francesco ^a   Sansotera, Maurizio ^a   Vazquez, Rebeca Martinez ^a   Osellame, Roberto ^a   Cerullo, Giulio ^a   Navarrini, Walter ^a,b  

^a POLITECNICO DI MILANO   (Italy)

^b Piazza Leonardo da Vinci ^*  (Italy)

Author keywords

Anhydrous hydrogen fluoride; FLICE; Laser micromachining; Selective etching; Silicon dioxide

Indexed keywords

ANHYDROUS HYDROGEN FLUORIDES; CHEMICAL ETCHING; DIFFUSION LIMITED; DYNAMIC DISPLACEMENTS; ETCHING PROCESS; FLICE; GASPHASE; HF ETCHING; HYDROGEN FLUORIDE; LASER MICRO-MACHINING; MICRO-MANUFACTURING; SELECTIVE ETCHING; THREE-DIMENSIONAL MICROFLUIDICS;

ASPECT RATIO; MICROCHANNELS; SILICA; ULTRASHORT PULSES;

ETCHING;

EID: 84872011497     PISSN: None     EISSN: 2072666X     Source Type: Journal    
DOI: 10.3390/mi3040604     Document Type: Article

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