Interfacial dipole formation and surface-electron confinement in low-coverage self-assembled thiol layers: Thiophenol and p-fluorothiophenol on Cu(111)

ACS Nano

Volumn 6, Issue 12, 2012, Pages 10622-10631

  Hong, Sung Young ^a   Yeh, Po Chun ^a   Dadap, Jerry I ^b   Osgood, Richard M ^b  

^a Howard Hughes Medical Institute   (United States)

^b Fu Foundation School of Engineering and Applied Science   (United States)

Author keywords

Cu (111); electron confinement; interfacial dipole; self assembled monolayer; thiophenol; two photon photoemission

Indexed keywords

CU(1 1 1); ELECTRON CONFINEMENT; INTERFACIAL DIPOLES; THIOPHENOLS; TWO-PHOTON PHOTOEMISSION;

ADSORBATES; ATOMIC PHYSICS; CHARGE TRANSFER; ELECTRONIC STATES; ELECTRONIC STRUCTURE; ORGANIC POLYMERS; SELF ASSEMBLED MONOLAYERS;

PLASMA CONFINEMENT;

EID: 84871551582     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn303715d     Document Type: Article

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