H-atom position as pattern-determining factor in arenethiol films

Journal of the American Chemical Society

Volumn 131, Issue 15, 2009, Pages 5540-5545

  Kwon, Ki Young ^a,b   Pawin, Greg ^a,c   Wong, Kin L ^a,c   Peters, Eric ^a   Kim, Daeho ^a   Hong, Sampyo ^d   Rahman, Talat S ^d   Marsella, Michael ^a   Bartels, Ludwig ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

^d UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AROMATIC MOIETIES; ATOM POSITIONS; BENZENETHIOL; CU(1 1 1); GUIDING PRINCIPLES; HYDROGEN ATOMS; INTERMOLECULAR INTERACTIONS; ORTHO POSITION; PATTERN FORMATION; TERMINAL POSITION;

ATOMS; HYDROGEN;

HYDROGEN BONDS;

COPPER; HYDROGEN; THIOL DERIVATIVE; THIOPHENOL; ANTHANTHRENE; AROMATIC HYDROCARBON; BENZO[A]PYRENE DERIVATIVE;

ARTICLE; HYDROGEN BOND; MOLECULAR INTERACTION; ARTIFICIAL MEMBRANE; CHEMISTRY;

BENZOPYRENES; HYDROCARBONS, AROMATIC; HYDROGEN BONDING; MEMBRANES, ARTIFICIAL; SULFHYDRYL COMPOUNDS;

EID: 67949112576     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja809417k     Document Type: Article

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