|
Volumn 551, Issue , 2013, Pages 562-567
|
On thickness and annealing dependence of optical properties of Te 67.5 Ga2.5 As30 thin film as optoelectronic material
|
Author keywords
Chalcogenides; Optical properties; Refractive index; Thermal annealing; Thin film; Transmission spectra
|
Indexed keywords
ABSORPTION MECHANISMS;
ANNEALING TEMPERATURES;
CRYSTALLINE PHASIS;
HIGH-FREQUENCY DIELECTRICS;
OPTICAL ENERGY GAP;
OPTOELECTRONIC MATERIALS;
REFLECTION SPECTRA;
THERMAL-ANNEALING;
TRANSMISSION SPECTRUMS;
ANNEALING;
CHALCOGENIDES;
FILM THICKNESS;
GALLIUM;
OPTICAL PROPERTIES;
OPTOELECTRONIC DEVICES;
REFRACTIVE INDEX;
THIN FILMS;
X RAY DIFFRACTION;
FILM PREPARATION;
|
EID: 84871014723
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2012.11.001 Document Type: Article |
Times cited : (23)
|
References (28)
|