Improved efficiency of multicrystalline silicon solar cells by TiO 2 antireflection coatings derived by APCVD process

Materials Science in Semiconductor Processing

Volumn 16, Issue 1, 2013, Pages 113-117

  Hocine, D ^a   Belkaid, M S ^a   Pasquinelli, M ^b   Escoubas, L ^b   Simon, J J ^b   Riviere G A ^b   Moussi, A ^c  

^a UNIVERSITÉ MOULOUD MAMMERI   (Algeria)

^b AIX MARSEILLE UNIVERSITÉ   (France)

^c L'Unite de Developpement de la Technologie du Silicium   (Algeria)

Author keywords

Antireflection coating; APCVD; Efficiency; Solar cell; Titanium dioxide

Indexed keywords

ANTI-REFLECTIVE LAYERS; APCVD; APCVD METHOD; ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; CELL SURFACES; EFFICIENCY ENHANCEMENT; ELEMENTAL COMPOSITIONS; ENERGY DISPERSIVE X RAY SPECTROSCOPY; FABRICATION PROCESS; LOW COST TECHNOLOGY; LOW COSTS; MULTI-CRYSTALLINE SILICON SOLAR CELLS; MULTICRYSTALLINE CELLS; SURFACE AREA; TIO;

ATMOSPHERIC PRESSURE; CELL MEMBRANES; CHEMICAL VAPOR DEPOSITION; COATINGS; CONVERSION EFFICIENCY; EFFICIENCY; POLYSILICON; SCANNING ELECTRON MICROSCOPY; SILICON SOLAR CELLS; SOLAR CELLS; TITANIUM DIOXIDE; VAPORS; X RAY SPECTROSCOPY;

ANTIREFLECTION COATINGS;

EID: 84870462950     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2012.06.004     Document Type: Article

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