Magnetic field alignment of randomly oriented, high aspect ratio silicon microwires into vertically oriented arrays

ACS Nano

Volumn 6, Issue 11, 2012, Pages 10303-10310

  Beardslee, Joseph A ^a   Sadtler, Bryce ^a   Lewis, Nathan S ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

image analysis; magnetic coatings; Ni electrodeposition; vapor liquid solid growth; X ray diffraction

Indexed keywords

ACTIVE ELEMENTS; COATING THICKNESS; DEGREE OF ALIGNMENTS; DIRECTED ASSEMBLY; ELECTRONIC DEVICE; EXTERNAL MAGNETIC FIELD; FIELD STRENGTHS; HIGH ASPECT RATIO; IMAGE ANALYSIS TECHNIQUES; MAGNETIC COATINGS; MAGNETIC FIELD ALIGNMENT; MAGNETIC HISTORY; MAGNETIC TORQUES; MICRO WIRE; MICRO-SCALE COMPONENTS; NI ELECTRODEPOSITION; NICKEL FILM; POTENTIAL APPLICATIONS; SEMICONDUCTOR WIRES; SI MICROWIRES; SI SUBSTRATES; SUBSTRATE SURFACE; VAPOR-LIQUID-SOLID GROWTH; VERTICAL ALIGNMENT; VERTICALLY ALIGNED; WIRE LENGTH;

ALIGNMENT; ASPECT RATIO; COATINGS; IMAGE ANALYSIS; MAGNETIC FIELDS; SURFACE PROPERTIES; THICKNESS MEASUREMENT; VAPORS; WIRE; X RAY DIFFRACTION;

SILICON;

NANOTUBE; SILICON;

ARTICLE; CHEMISTRY; CONFORMATION; MACROMOLECULE; MAGNETIC FIELD; MATERIALS TESTING; PARTICLE SIZE; RADIATION DOSE; RADIATION EXPOSURE; SURFACE PROPERTY; ULTRASTRUCTURE;

MACROMOLECULAR SUBSTANCES; MAGNETIC FIELDS; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOTUBES; PARTICLE SIZE; RADIATION DOSAGE; SILICON; SURFACE PROPERTIES;

EID: 84870407111     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn304180k     Document Type: Article

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