Large-scale hierarchical organization of nanowire arrays for integrated nanosystems

Nano Letters

Volumn 3, Issue 9, 2003, Pages 1255-1259

  Whang, Dongmok ^a   Jin, Song ^a   Wu, Yue ^a   Lieber, Charles M ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARTICLE; DEVICE; ELECTRICITY; SCALE UP; TECHNIQUE;

EID: 0141510585     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl0345062     Document Type: Article

References (24)

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18. 17 Assembly was carried out using 20, 40, and 80 nm diameter NW samples. Stable solutions of the NWs were made from a 3:1 (v/v) mixture of isooctane and 2-propanol containing 1-octadecylamine (0.25 mM), which coordinates reversibly to the silicon NW surfaces. The solubility of the surfactant and resulting rate of the compression was controlled by the subphase pH. While the surface pressure was kept at constant value (55-60 mN/m), the area of the Langmuir monolayer was continuously reduced by the dissolution of the surfactant into the water subphase.
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22. Shipley S1813 photoresist was deposited by spin coating (4000 rpm for 40 s) onto aligned NW covered substrates, baked at 110°C for 4 min, and then exposed for ca. 2 s on an ABM photoaligner. After developing for 1 min, substrates were sonicated for 30 s in DI water to remove exposed NWs, and then the remaining photoresist covering the NW arrays was dissolved in acetone.
23. Jin, S.; Whang, D.; Wu, Y.; McAlpine, M. C.; Friedman, R. S.; Lieber, C. M., submitted for publication.
24. 2), etched in buffered HF (Transenes, Inc.) for 8 s, and then Ti/Au (50/30 nm) electrodes were deposited by electron beam evaporation.