SCOPUS 정보 검색 플랫폼

Volumn 552, Issue , 2013, Pages 1-5

Effects of oxygen gas pressure on properties of iron oxide films grown by pulsed laser deposition

(8) Guo, Qixin a,c Shi, Wangzhou a Liu, Feng a Arita, Makoto b Ikoma, Yoshifumi b Saito, Katsuhiko c Tanaka, Tooru c Nishio, Mitsuhiro c

a SHANGHAI NORMAL UNIVERSITY (China)

b KYUSHU UNIVERSITY (Japan)

c SAGA UNIVERSITY (Japan)

Author keywords

Magnetic properties; Magnetite films; Oxygen gas pressure; Pulsed laser deposition; X ray absorption fine structure

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC PHYSICS; CRYSTAL ATOMIC STRUCTURE; CRYSTAL STRUCTURE; DEPOSITION; GAS ABSORPTION; GASES; IRON; IRON OXIDES; MAGNETIC PROPERTIES; MAGNETITE; OXYGEN; PULSED LASER DEPOSITION; PULSED LASERS; SAPPHIRE; SUBSTRATES; X RAY ABSORPTION; X RAY DIFFRACTION;

CRYSTAL QUALITIES; MAGNETITE FILMS; MORPHOLOGY AND CRYSTAL STRUCTURES; OXYGEN GAS PRESSURE; SAPPHIRE SUBSTRATES; SINGLE PHASE; SUBSTRATE TEMPERATURE; X RAY ABSORPTION FINE STRUCTURES;

OXIDE FILMS;

EID: 84869869532 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2012.10.088 Document Type: Article

Times cited : (8)

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