A study of blister formation in ALD Al2O3 grown on silicon

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2012, Pages 1135-1138

  Vermang, Bart ^a,b   Goverde, Hans ^a,c   Simons, Veerle ^a   De Wolf, Ingrid ^a,b   Meersschaut, Johan ^a   Tanaka, Shuji ^d   John, Joachim ^a   Poortmans, Jef ^a,b   Mertens, Robert ^a,b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^d TOHOKU UNIVERSITY   (Japan)

Author keywords

aluminum oxide; atomic layer deposition; blistering; external load; residual stress; silicon

Indexed keywords

ALUMINUM OXIDES; BLISTER FORMATION; BLISTERING; EXTERNAL LOADS; LOADING CONFIGURATION; MEMBRANE STRESS; PRE-STRESSED; TENSILE RESIDUAL STRESS;

ALUMINUM; HYDROSTATIC PRESSURE; LOADING; RESIDUAL STRESSES; SILICON;

ATOMIC LAYER DEPOSITION;

EID: 84869467211     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2012.6317802     Document Type: Conference Paper

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