Lithography simulation for the fabrication of silicon photonic devices with deep-ultraviolet lithography

IEEE International Conference on Group IV Photonics GFP

Volumn , Issue , 2012, Pages 288-290

  Wang, Xu ^a   Shi, Wei ^a   Hochberg, Michael ^b   Adam, Kostas ^c   Schelew, Ellen ^a   Young, Jeff F ^a   Jaeger, Nicolas A F ^a   Chrostowski, Lukas ^a  

^a UNIVERSITY OF BRITISH COLUMBIA   (Canada)

^b UNIVERSITY OF DELAWARE   (United States)

^c MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION PROCESS; LITHOGRAPHY SIMULATION; MEASURED RESULTS; SILICON PHOTONIC DEVICES;

FABRICATION; PHOTONIC DEVICES; PHOTONICS;

LITHOGRAPHY;

EID: 84869195426     PISSN: 19492081     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/GROUP4.2012.6324162     Document Type: Conference Paper

References (7)

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2. X. Wang, W. Shi, R. Vafaei, N. Jaeger, and L. Chrostowski, "Uniform and sampled Bragg gratings in SOI strip waveguides with sidewall corrugations," IEEE Photon. Technol. Lett., vol. 23, no. 5, pp. 290-292, 2011.
3. W. Bogaerts, P. Bradt, L. Vanholme, P. Bienstman, and R. Baets, "Closed-loop modeling of silicon nanophotonics from design to fabrication and back again," Opt. Quant. Electron., vol. 40, no. 11-12, pp. 801-811, 2008.
4. http://www.mentor.com/products/ic-manufacturing/computationallithography/
5. http://www.lumerical.com/
6. W. A. Zortman, D. C. Trotter, and M. R. Watts, "Silicon photonics manufacturing," Opt. Express, vol. 18, no. 23, pp. 23598-23607, 2010.
7. A. D. Simard, N. Ayotte, Y. Painchaud, S. Bdard, and S. LaRochelle, "Impact of sidewall roughness on integrated Bragg gratings," J. Lightwave Technol., vol. 29, no. 24, pp. 3693-3704, 2011.