Closed-loop modeling of silicon nanophotonics from design to fabrication and back again

Optical and Quantum Electronics

Volumn 40, Issue 11-12 SPEC. ISS., 2008, Pages 801-811

  Bogaerts, Wim ^a   Bradt, Paul ^a   Vanholme, Lieven ^a   Bienstman, Peter ^a   Baets, Roel ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

Design; Lithography; Modeling; Nanophotonics

Indexed keywords

BLACK-BOX COMPONENTS; CLOSED-LOOP; DISTRIBUTED BRAGG MIRRORS; FABRICATION PROCESS; FUNCTIONAL PARAMETERS; GEOMETRIC LAYOUT; MASK LAYOUT; MODELING; OPTIMIZATION LOOP; PROJECTION LITHOGRAPHY;

DESIGN; FABRICATION; INTEGRATED OPTOELECTRONICS; NANOPHOTONICS; OPTICAL WAVEGUIDES; OPTIMIZATION; PHOTOLITHOGRAPHY;

PHOTONICS;

EID: 67749135406     PISSN: 03068919     EISSN: 1572817X     Source Type: Journal    
DOI: 10.1007/s11082-008-9265-y     Document Type: Article

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