Deposition of ZnO and MgZnO films by magnetron sputtering

Vacuum

Volumn 89, Issue 1, 2013, Pages 254-256

  Xiong, D P ^a   Tang, X G ^a   Zhao, W R ^a   Liu, Q X ^a   Wang, Y H ^a   Zhou, S L ^b,c  

^a GUANGDONG UNIVERSITY OF TECHNOLOGY   (China)

^b ZHEJIANG UNIVERSITY OF TECHNOLOGY   (China)

^c SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

Magnetron sputtering; MgZnO films; Photoluminescence

Indexed keywords

ANNEALING TREATMENTS; BAND-EDGE EMISSIONS; BLUE SHIFT; PHOTOLUMINESCENCE SPECTRUM; PREFERRED ORIENTATIONS; RADIO FREQUENCY MAGNETRON SPUTTERING; SI SUBSTRATES; SPUTTERING PRESSURES; SUBSTRATE TEMPERATURE; ZNO;

MAGNETRON SPUTTERING; PHOTOLUMINESCENCE; SUBSTRATES; X RAY DIFFRACTION; ZINC;

ZINC OXIDE;

EID: 84869096406     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2012.05.030     Document Type: Conference Paper

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