Electrical properties of in vitro biomineralized recombinant silicatein deposited by microfluidics

Applied Physics Letters

Volumn 101, Issue 19, 2012, Pages

  Pagliara, Stefano ^a,e   Polini, Alessandro ^a,f   Camposeo, Andrea ^a,b   Schröder, Heinz C ^c   Müller, Werner E G ^c   Pisignano, Dario ^a,b,d  

^a NATIONAL NANOTECHNOLOGY LABORATORY   (Italy)

^b ISTITUTO ITALIANO DI TECNOLOGIA   (Italy)

^c JOHANNES GUTENBERG UNIVERSITY   (Germany)

^d UNIVERSITY OF SALENTO   (Italy)

^e UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^f LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED BIAS; ATOMIC FORCE; BIOMINERALIZATION PROCESS; BIOSILICA; CONFOCAL FLUORESCENCE; IN-VITRO; INCUBATION TIME; METAL INSULATOR METALS; PLANAR ELECTRODE; PRESSURE-DRIVEN; SILICA LAYERS; SILICATEIN;

BIOMINERALIZATION; DEPOSITS; LEAKAGE CURRENTS; MICROFLUIDICS; OCEAN HABITATS; SCANNING ELECTRON MICROSCOPY; SILICA;

ELECTRIC PROPERTIES;

EID: 84869054769     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4766186     Document Type: Article

References (40)

1. M. Muccini, Nature Mater. 5, 605 (2006). 10.1038/nmat1699
2. S. J. Kim and J.-S. Lee, Nano Lett. 10, 2884 (2010). 10.1021/nl1009662
3. C. J. Bettinger and Z. Bao, Adv. Mater. 22, 651 (2010). 10.1002/adma.200902322
4. G. Gelinck, P. Heremans, K. Nomoto, and T. D. Anthopoulos, Adv. Mater. 22, 3778 (2010). 10.1002/adma.200903559
5. M. A. McCarthy, B. Liu, E. P. Donoghue, I. Kravchenko, D. Y. Kim, F. So, and A. G. Rinzler, Science 332, 570 (2011). 10.1126/science.1203052
6. A. C. Arias, J. D. Mackenzie, I. McCulloch, J. Rivnay, and A. Salleo, Chem. Rev. 110, 3 (2010). 10.1021/cr900150b
7. H. Klauk, Chem. Soc. Rev. 39, 2643 (2010). 10.1039/b909902f
8. H. Yan, Z. Chen, Y. Zheng, C. Newman, J. R. Quinn, F. Dötz, M. Kastler, and A. Facchetti, Nature 457, 679 (2009). 10.1038/nature07727
9. K. H. Büchel, H. H. Moretto, and P. Woditsch, Industrial Inorganic Chemistry (Wiley-VCH, Weinheim, Germany, 2000).
10. R. Doering and Y. Nishi, Handbook of Semiconductor Manufacturing Technology (CRC, USA, 2007).
11. Th. B. Singh, F. Meghdadi, S. Günes, N. Marjanovic, G. Horowitz, P. Lang, S. Bauer, and N. S. Sariciftci, Adv. Mater. 17, 2315 (2005). 10.1002/adma.200501109
12. C. A. Lee, D.-W. Park, K.-D. Jung, B.-J. Kim, Y. C. Kim, J. D. Lee, and B.-G. Park, Appl. Phys. Lett. 89, 262120 (2006). 10.1063/1.2425042
13. M. Halik, H. Klauk, U. Zschieschang, G. Schmid, W. Radlik, and W. Weber, Adv. Mater. 14, 1717 (2002). 10.1002/1521-4095(20021203)14:23<1717::AID- ADMA1717>3.0.CO;2-G
14. J. H. Park, D. K. Hwang, J. Lee, S. Im, and E. Kim, Thin Solid Films 515, 4041 (2007). 10.1016/j.tsf.2006.10.121
15. J. H. Cho, J. Lee, Y. Xia, B. Kim, Y. He, M. J. Renn, T. P. Lodge, and C. D. Frisbie, Nature Mater. 7, 900 (2008). 10.1038/nmat2291
16. A. R. Abate, D. Lee, T. Do, C. Holtze, and D. A. Weitz, Lab Chip 8, 516 (2008). 10.1039/b800001h
17. T. Cui and G. Liang, Appl. Phys. Lett. 86, 064102 (2005). 10.1063/1.1861126
18. Y. S. Kim, K. H. Jung, U. R. Lee, K. H. Kim, M. H. Hoang, J.-I. Jin, and D. H. Choi, Appl. Phys. Lett. 96, 103307 (2010). 10.1063/1.3299022
19. M. Irimia-Vladu, P. A. Troshin, M. Reisinger, G. Schwabegger, M. Ullah, R. Schwoediauer, A. Mumyatov, M. Bodea, J. W. Fergus, and V. F. Razumov, Org. Electron. 11, 1974 (2010). 10.1016/j.orgel.2010.09.007
20. C.-H. Wang, C.-Y. Hsieh, and J.-C. Hwang, Adv. Mater. 23, 1630 (2011). 10.1002/adma.201004071
21. J.-W. Chang, C.-G. Wang, C.-Y. Huang, T.-D. Tsai, T.-F. Guo, and T.-C. Wen, Adv. Mater. 23, 4077 (2011). 10.1002/adma.201102124
22. A. Polini, S. Pagliara, A. Camposeo, A. Biasco, H. C. Schröder, W. E. G. Müller, and D. Pisignano, Adv. Mater. 23, 4674 (2011). 10.1002/adma.201102691
23. A. Polini, S. Pagliara, A. Camposeo, R. Cingolani, X. Wang, H. C. Schröder, W. E. G. Müller, and D. Pisignano, Sci. Rep. 2, 607 (2012). 10.1038/srep00607
24. V. Tesar, Pressure-Driven Microfluidics (Artech House, Boston, 2007).
25. K. W. Oh, K. Lee, B. Ahna, and E. P. Furlani, Lab Chip 12, 515 (2012). 10.1039/c2lc20799k
26. S. Pagliara, C. Chimerel, R. Langford, D. G. A. L. Aarts, and U. F. Keyser, Lab Chip 11, 3365 (2011). 10.1039/c1lc20399a
27. J. Yakovleva, R. Davidsson, M. Bengtsson, T. Laurell, and J. Emnéus, Biosens. Bioelectron. 19, 21 (2003). 10.1016/S0956-5663(03)00126- X
28. E. Bäuerlein, Biomineralization (Wiley-VCH, Weinheim, Germany, 2004).
29. X. Wang, M. Wiens, H. C. Schröder, S. Hu, E. Mugnaioli, U. Kolb, W. Tremel, D. Pisignano, and W. E. G. Müller, Adv. Eng. Mater. 12, B422 (2010). 10.1002/adem.200980042
30. J. N. Cha, K. Shimizu, Y. Zhou, S. C. Christiansen, B. F. Chmelka, G. D. Stucky, and D. E. Morse, Proc. Natl. Acad. Sci. U.S.A. 96, 361 (1999). 10.1073/pnas.96.2.361
31. K. Shimizu, J. Cha, G. D. Stucky, and D. E. Morse, Proc. Natl. Acad. Sci. U.S.A. 95, 6234 (1998). 10.1073/pnas.95.11.6234
32. R. Cattaneo-Vietti, G. Bavestrello, C. Cerrano, M. Sarà, U. Benatti, M. Giovine, and E. Gaino, Nature 383, 397 (1996). 10.1038/383397b0
33. A. Armirotti, G. Damonte, M. Pozzolini, F. Mussino, C. Cerrano, A. Salis, U. Benatti, and M. Giovine, J. Proteome Res. 8, 3995 (2009). 10.1021/pr900342y
34. U. Schlomacher, M. Wiens, H. C. Schröder, X. Wang, K. P. Jochum, and W. E. G. Müller, FEBS J. 278, 1145 (2011). 10.1111/j.1742-4658.2011.08040. x
35. D. Bodas and C. Khan-Malek, Microelectron. Eng. 83, 1277 (2006). 10.1016/j.mee.2006.01.195
36. K. L. Osborne III, Temperature-dependence of the contact angle of water on graphite, silicon, and gold., M.S. thesis (Worcester Polytechnic Institute, 2009).
37. V. Jokinen and S. Franssila, Microfluid. Nanofluid. 5, 443 (2008). 10.1007/s10404-008-0263-y
38. D. Pisignano, F. Di Benedetto, L. Persano, G. Gigli, and R. Cingolani, Langmuir 20, 4802 (2004). 10.1021/la049943q
39. C. C. Perry, Rev. Mineral. Geochem. 54, 291 (2003). 10.2113/0540291
40. S. V. Patwardhan, Chem. Commun. 47, 7567 (2011). 10.1039/c0cc05648k