Evolution of local work function in epitaxial VO 2 thin films spanning the metal-insulator transition

Applied Physics Letters

Volumn 101, Issue 19, 2012, Pages

  Sohn, Ahrum ^a   Kim, Haeri ^a   Kim, Dong Wook ^a   Ko, Changhyun ^b   Ramanathan, Shriram ^b   Park, Jonghyurk ^c   Seo, Giwan ^c,d   Kim, Bong Jun ^c   Shin, Jun Hwan ^c,d   Kim, Hyun Tak ^c,d  

^a Ewha Womans University   (South Korea)

^b HARVARD UNIVERSITY   (United States)

^c Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^d University of Science and Technology (UST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BANDBENDING; ELECTRONIC BAND STRUCTURE; KELVIN PROBE FORCE MICROSCOPY; LOCAL WORK FUNCTION; RESISTANCE PROFILES; STATISTICAL DEVIATIONS;

EPITAXIAL GROWTH; METAL INSULATOR TRANSITION; SEMICONDUCTOR INSULATOR BOUNDARIES; THIN FILMS;

WORK FUNCTION;

EID: 84869050624     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4766292     Document Type: Article

References (16)

1. T. M. Rice, H. Launois, and J. P. Pouget, Phys. Rev. Lett. 73, 3042 (1994). 10.1103/PhysRevLett.73.3042
2. J. B. Goodenough, J. Solid State Chem. 3, 490 (1971). 10.1016/0022-4596(71)90091-0
3. H.-T. Kim, B.-G. Chae, D.-H. Youn, S.-L. Maeng, G. Kim, K.-Y. Kang, and Y.-S. Lim, New J. Phys. 6, 52 (2004). 10.1088/1367-2630/6/1/052
4. B. S. Mun, K. Chen, J. Yoon, C. Dejoie, N. Tamura, M. Kunz, Z. Liu, M. E. Grass, S.-K. Mo, C. Park, Y. Y. Lee, and H. Ju, Phys. Rev. B 84, 113109 (2011). 10.1103/PhysRevB.84.113109
5. W.-T. Liu, J. Cao, W. Fan, Z. Hao, M. C. Martin, Y. R. Shen, J. Wu, and F. Wang, Nano Lett. 11, 466 (2011). 10.1021/nl1032205
6. Y. J. Chang, J. S. Yang, Y. S. Kim, D. H. Kim, T. W. Noh, D.-W. Kim, E. Oh, B. Kahng, and J.-S. Chung, Phys. Rev. B 76, 075118 (2007). 10.1103/PhysRevB.76.075118
7. W. Yin, S. Wolf, C. Ko, S. Ramanathan, and P. Reinke, J. Appl. Phys. 109, 024311 (2011). 10.1063/1.3528167
8. C. Ko, Z. Yang, and S. Ramanathan, ACS Appl. Mater. Interfaces 3, 3396 (2011). 10.1021/am2006299
9. S. Zhang, I. S. Kim, and L. J. Lauhon, Nano Lett. 11, 1443 (2011). 10.1021/nl103925m
10. M. M. Qazilbash, A. Tripathi, A. A. Shafgans, B.-J. Kim, H.-T. Kim, Z. Cai, M. V. Holt, J. M. Maser, F. Keilmann, O. G. Shpyrko, and D. N. Basov, Phys. Rev. B 83, 165108 (2011). 10.1103/PhysRevB.83.165108
11. K. Appavoo and R. F. Haglund, Jr., Nano Lett. 11, 1025 (2011). 10.1021/nl103842v
12. T. Driscoll, H.-T. Kim, B.-G. Chae, B.-J. Kim, Y.-W. Lee, N. M. Jokerst, S. Palit, D. R. Smith, M. Di Ventra, and D. N. Basov, Science 325, 1518 (2009). 10.1126/science.1176580
13. H. Yin, M. Luo, K. Yu, Y. Gao, R. Huang, Z. Zhang, M. Zeng, C. Cao, and Z. Zhu, ACS Appl. Mater. Interfaces 3, 2057 (2011). 10.1021/am200291a
14. R. Jaramillo and S. Ramanathan, Adv. Funct. Mater. 21, 4068 (2011). 10.1002/adfm.201101069
15. H. Kim, S. Hong, and D.-W. Kim, Appl. Phys. Lett. 100, 022901 (2012). 10.1063/1.3675630
16. V. E. Henrich and P. A. Cox, The Surface Science of Metal Oxides (Cambridge University Press, Cambridge, 1994).