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Volumn 52, Issue 10, 2012, Pages 881-889

Mass Spectrometric Investigations of Nano-Size Cluster Ions Produced by High Pressure Magnetron Sputtering

Author keywords

Ag cluster films; Ag nanoparticles; Magnetron sputtering; Quadrupole mass filter; TEM

Indexed keywords

BANDPASS FILTERS; CLUSTER ANALYSIS; FLOW OF GASES; MAGNETRON SPUTTERING; MASS SPECTROMETERS; MASS SPECTROMETRY; METAL NANOPARTICLES; NANOCLUSTERS; SIZE DISTRIBUTION;

EID: 84869044374     PISSN: 08631042     EISSN: 15213986     Source Type: Journal    
DOI: 10.1002/ctpp.201200046     Document Type: Article
Times cited : (39)

References (34)
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    • Planar magnetron sputtering, in: Thin film processes, edited by J. L. Vossen and W. Kern (Academic Press, Inc., 24-28 Oval Road, London NW1 7DX, 1978) 131-173.
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    • Influence of target erosion on the cluster formation in the planar dc magnetron sputtering source, Submitted to Surface and Coatings Technology, 2012.
    • M. Ganeva, A. V. Pipa, and R. Hippler, Influence of target erosion on the cluster formation in the planar dc magnetron sputtering source, Submitted to Surface and Coatings Technology, 2012.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.