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Volumn 23, Issue 48, 2012, Pages

The atomic layer deposition array defined by etch-back technique: A new method to fabricate TiO 2 nanopillars, nanotubes and nanochannel arrays

Author keywords

[No Author keywords available]

Indexed keywords

ETCH-BACK TECHNIQUE; FABRICATION METHOD; FUNCTIONAL SURFACES; HIGH ASPECT RATIO NANO-STRUCTURES; HIGH QUALITY; HIGH THROUGHPUT; NANO CHANNELS; NANO-PILLAR ARRAYS; NANOPILLARS; PHYSICAL AND CHEMICAL PROPERTIES; PROCESS STEPS; TIO; VARIOUS SUBSTRATES;

EID: 84869026634     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/48/485306     Document Type: Article
Times cited : (19)

References (25)
  • 4
    • 0023451146 scopus 로고
    • 10.1007/BF01133326 0022-2461
    • Van Noort R 1987 J. Mater. Sci. 22 3801-11
    • (1987) J. Mater. Sci. , vol.22 , Issue.11 , pp. 3801-3811
    • Van Noort, R.1
  • 5
    • 84882881440 scopus 로고
    • 10.1364/AO.28.003303 0003-6935
    • Bennett J M et al 1989 Appl. Opt. 28 3303-17
    • (1989) Appl. Opt. , vol.28 , Issue.16 , pp. 3303-3317
    • Bennett, J.M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.