SCOPUS 정보 검색 플랫폼

Vacuum

Volumn 90, Issue 1, 2013, Pages 39-43

Effect of SHI irradiation on the morphology of SnO2 thin film prepared by reactive thermal evaporation

(6) Abhirami, K M a Matheswaran, P a Gokul, B a Sathyamoorthy, R a Kanjilal, D b Asokan, K b

a KONGUNADU ARTS AND SCIENCE COLLEGE (India)

b INTER UNIVERSITY ACCELERATOR CENTRE (India)

Author keywords

AFM; FE SEM; Roughness; SHI irradiation; SnO2

Indexed keywords

AFM; DIFFUSION PROCESS; FE-SEM; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; FLUENCES; GLASS SUBSTRATES; MORPHOLOGICAL CHANGES; REGULAR STRUCTURE; SHI IRRADIATION; SNO2; SWIFT HEAVY ION IRRADIATION; THERMAL SPIKE MODEL;

ATOMIC FORCE MICROSCOPY; FIELD EMISSION MICROSCOPES; IRRADIATION; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS;

FILM PREPARATION;

EID: 84868250469 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/j.vacuum.2012.09.013 Document Type: Conference Paper

Times cited : (45)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.