250 keV Ar2+ ion beam induced grain growth in tin oxide thin films

Surface and Coatings Technology

Volumn 203, Issue 17-18, 2009, Pages 2410-2414

  Mohanty, T ^a   Dhounsi, S ^a   Kumar, P ^b   Tripathi, A ^b   Kanjilal, D ^b  

^a JAWAHARLAL NEHRU UNIVERSITY   (India)

^b INTER UNIVERSITY ACCELERATOR CENTRE   (India)

Author keywords

AFM; Grain Growth; Ion bombardment; UV VIS optical absorption; XRD

Indexed keywords

ABSORPTION BANDS; AFM; ARGON-IONS; ATOMIC-FORCE MICROSCOPIES; E-BEAM EVAPORATIONS; ENERGY RANGES; GLANCING ANGLE X-RAY DIFFRACTIONS; INDUCED DEFECTS; NANO-CRYSTALLINE; NANO-CRYSTALLINE THIN FILMS; NANOCRYSTALLINE GRAINS; OPTICAL CHARACTERIZATIONS; QUANTUM CONFINEMENT EFFECTS; RED SHIFTS; SAPPHIRE SUBSTRATES; SUBSTRATE TEMPERATURES; SURFACE MODIFICATIONS; TIN OXIDE THIN FILMS; UV-VISIBLE SPECTROSCOPIES; UV/VIS OPTICAL ABSORPTION; XRD;

ABSORPTION; AGGLOMERATION; ARGON; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ATOMS; CORUNDUM; FLAT CABLES; GRAIN SIZE AND SHAPE; ION BEAMS; ION BOMBARDMENT; IONS; LIGHT ABSORPTION; NANOCRYSTALLINE MATERIALS; OPTICAL MICROSCOPY; OXIDE FILMS; OXIDE MINERALS; QUARTZ; SUBSTRATES; SURFACE DIFFUSION; THIN FILMS; TIN; TITANIUM COMPOUNDS; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

GRAIN GROWTH;

EID: 67349113189     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.02.108     Document Type: Article

References (15)

1. Brus L. J. Phys. Chem. 90 (1986) 2555
2. Gu F., Wang S.F., Song C.F., Lu M.K., Qi Y.X., Zhou G.J., Xu d., and Yuan D.R. Chem. Phys. Lett. 372 (2003) 451
3. Shukla S., and Seal S. J. Nanosci. Nanotechnol. 4 (2004) 125
4. Pan X.Q., Fu L., and Dominguez. J. Appl. Phys. 89 (2001) 6056
5. Bolse W. Nucl. Instrum. Methods B 244 (2006) 8
6. Kirkby K.J., and Webb R.P. Encycl. Nanosci. Nanotechnol. 4 (2004) 1
7. Linnros J., Hlmen G., and Svensson B. Phys. Rev. B 32 (1985) 2770
8. Baglin J.E.E. IBM J. Res. Develop. 38 (1994) 413
9. Gurbiiz H., Badem G., and Bulticu A.N. J. Cryst. Growth 283 (2005) 222
10. Parry P.D. J. Vac. Sci. Technol. 13 (1976) 622
11. Nakata J. J. Appl. Phys. 79 (1996) 682
12. Xu Q., Sharp I.D., Yuan C.W., Yi D.O., Liao C.Y., Glaeser A.M., Minor A.M., Beeman J.W., Ridgway M.C., Kluth P., Ager III J.W., Chrzan D.C., and Haller E.E. J. Phys.: Conf. Ser. 61 (2007) 1042 [IOP publishing]
13. Suo Z., and Lu W. J. Nanopart. Res. 2 (2000) 333
14. Spinella C., Lombardo S., and Campisano S.U. Phys. Rev. Lett. 66 (1991) 1102
15. Mohanty T., Batra Y., Tripathi A., and Kanjilal D. J. Nanosci. Nanotechnol. 7 (2007) 2036