Near-field scanning optical microscopy enables direct observation of Moiré effects at the nanometer scale

ACS Nano

Volumn 6, Issue 10, 2012, Pages 9141-9149

  Lin, Wei Feng ^a   Li, Jie Ren ^a   Liu, Gang Yu ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Moire effect; Moire pattern; near field scanning optical microscopy; particle lithography

Indexed keywords

DIRECT VISUALIZATION; LATERAL DISPLACEMENTS; METAL NANOSTRUCTURE; MOIRE EFFECT; MOIRE PATTERN; NANO-METER SCALE; NANOMETER LEVEL; NANOSCALE LEVELS; NEAR-FIELD; NSOM IMAGES; PARTICLE LITHOGRAPHY; PHOTON TRANSMISSION; STRUCTURAL CHANGE; STRUCTURAL DETAILS;

NANOSTRUCTURES;

NEAR FIELD SCANNING OPTICAL MICROSCOPY;

METAL NANOPARTICLE;

ARTICLE; CHEMISTRY; LIGHT; MATERIALS TESTING; METHODOLOGY; RADIATION SCATTERING; REFRACTOMETRY; SCANNING TUNNELING MICROSCOPY; ULTRASTRUCTURE;

LIGHT; MATERIALS TESTING; METAL NANOPARTICLES; MICROSCOPY, SCANNING TUNNELING; REFRACTOMETRY; SCATTERING, RADIATION;

EID: 84867830280     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn303407j     Document Type: Article

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