Omnidirectional antireflective properties of porous tungsten oxide films with in-depth variation of void fraction and stoichiometry

Optics Communications

Volumn 285, Issue 24, 2012, Pages 5229-5234

  Vourdas, Nikolaos ^a   Dalamagkidis, Konstantinos ^b   Kostis, Ioannis ^a   Vasilopoulou, Maria ^a   Davazoglou, Dimitrios ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

Antireflective coatings; Hot wire deposition; RCWA; Tungsten oxide

Indexed keywords

ANGLES OF INCIDENCE; ANTI REFLECTIVE COATINGS; ANTIREFLECTIVE PROPERTIES; BROADBAND CHARACTERISTICS; GRADED REFRACTIVE INDICES; HOT WIRES; POROUS TUNGSTEN OXIDE FILMS; RCWA; REFLECTION MEASUREMENTS; REFLECTION SUPPRESSION; RIGOROUS COUPLED WAVE ANALYSIS; ROUGH VACUUM; SI SUBSTRATES; TUNGSTEN OXIDE;

DEPOSITS; SINGLE MODE FIBERS; SPECTROSCOPIC ELLIPSOMETRY; STOICHIOMETRY; TRACKING (POSITION); TUNGSTEN COMPOUNDS; VOID FRACTION; WIRE;

INTERFACES (MATERIALS);

EID: 84867578017     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2012.08.020     Document Type: Article

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