Spectroscopic evidence of NOx formation and band-gap narrowing in N-doped TiO2 films grown by pulsed magnetron sputtering

Materials Chemistry and Physics

Volumn 136, Issue 2-3, 2012, Pages 729-736

  Gago, R ^a   Redondo Cubero, A ^b   Vinnichenko, M ^c   Lehmann, J ^c   Munnik, F ^c   Palomares, F J ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b INSTITUTO SUPERIOR TÉCNICO   (Portugal)

^c INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

Electronic structure; Sputtering; Thin films; XAFS (EXAFS and XANES)

Indexed keywords

AMORPHOUS FILMS; DOPING (ADDITIVES); ELECTRONIC STRUCTURE; ENERGY GAP; MAGNETRON SPUTTERING; NANOCRYSTALS; NITROGEN OXIDES; OXIDE MINERALS; SPECTROSCOPIC ELLIPSOMETRY; SPUTTERING; STRUCTURAL PROPERTIES; SUBSTRATES; TITANIUM DIOXIDE; X RAY ABSORPTION; X RAY ABSORPTION NEAR EDGE STRUCTURE SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ELASTIC RECOIL DETECTION ANALYSIS; EXAFS; GRAZING-INCIDENCE X-RAY DIFFRACTION; PULSED MAGNETRON SPUTTERING; REACTIVE PULSED MAGNETRON SPUTTERING; SPECTROSCOPIC EVIDENCE; X RAY PHOTOEMISSION SPECTROSCOPY; X-RAY ABSORPTION NEAR-EDGE STRUCTURE;

THIN FILMS;

EID: 84867403329     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2012.07.049     Document Type: Article

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