Applications of quantum cascade lasers in plasma diagnostics: A review

Journal of Physics D: Applied Physics

Volumn 45, Issue 42, 2012, Pages

  Ropcke J ^a   Davies, P B ^b   Lang, N ^a   Rousseau, A ^c   Welzel, S ^d  

^a INP GREIFSWALD   (Germany)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c Centre National de la Recherche Scientifique   (France)

^d EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT STATUS; DECOMPOSITION PRODUCTS; DIAGNOSTIC EQUIPMENT; DIAGNOSTIC TECHNIQUES; EXTERNAL CAVITY; FEED GAS; FUNDAMENTAL PHYSICS; GAS TEMPERATURE; IN-SITU STUDY; INDUSTRIAL PROCESS MONITORING; INDUSTRIAL REQUIREMENTS; MID-INFRARED ABSORPTION SPECTROSCOPY; MIDINFRARED; MOLECULAR PHENOMENA; MOLECULAR PLASMAS; MOLECULAR SPECIES; MULTICOMPONENTS; NEW OPTIONS; POPULATION DENSITIES; PROCESSING PLASMA; QUANTUM CASCADES; SEMICONDUCTOR PROCESSING; SURFACE ACTIVATION; THIN-FILM DEPOSITIONS; TIME RESOLUTION;

CLEANING; HYDROCARBONS; LIGHT ABSORPTION; NITROGEN OXIDES; PLASMA DIAGNOSTICS; PLASMAS; POPULATION STATISTICS; PROCESS MONITORING; REACTION KINETICS; SILICON COMPOUNDS; WASTE TREATMENT;

QUANTUM CASCADE LASERS;

EID: 84867259097     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/45/42/423001     Document Type: Review

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