Fabrication of micro-nano surface texture by CsCl lithography with antireflection and photoelectronic properties for solar cells

Solar Energy Materials and Solar Cells

Volumn 108, Issue , 2013, Pages 93-97

  Liu, Jing ^a,b   Ashmkhan, Marina ^a,b   Dong, Gangqiang ^b   Wang, Bo ^a   Yi, Futing ^a  

^a INSTITUTE OF HIGH ENERGY PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Antireflection; Cesium chloride self assembly; Micro nano texture; Photoelectronic property; Solar cell

Indexed keywords

ANTI-REFLECTION; AVERAGE DIAMETER; CESIUM CHLORIDE; FABRICATING PROCESS; INCIDENCE ANGLES; MICRO-NANO; NANO-PILLAR ARRAYS; NANOPILLAR; NANOPILLARS; P-N JUNCTION; PARALLEL LIGHT; PHOTOELECTRONIC PROPERTIES; PHOTOVOLTAIC CONVERSION; PYRAMID ARRAYS; PYRAMID STRUCTURE; SURFACE TEXTURES;

CESIUM; CESIUM ALLOYS; CESIUM COMPOUNDS; CHLORINE COMPOUNDS; CONVERSION EFFICIENCY; NANOSTRUCTURES; PHOSPHORUS; SELF ASSEMBLY; SEMICONDUCTOR JUNCTIONS; SILICON WAFERS; TEXTURES;

SOLAR CELLS;

EID: 84867236777     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2012.09.016     Document Type: Conference Paper

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