Maskless fabrication of large scale Si nanohole array via laser annealed metal nanoparticles catalytic etching for photovoltaic application

Journal of Applied Physics

Volumn 108, Issue 2, 2010, Pages

  Wang, Fei ^a   Yu, Hong Yu ^a   Wang, Xincai ^b   Li, Junshuai ^a   Sun, Xiaowei ^a   Yang, Mingfei ^a   Wong, She Mein ^a   Zheng, Hongyu ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

AG NANOPARTICLE; CATALYTIC ETCHING; LASER ANNEALING; MASKLESS FABRICATION; METAL NANOPARTICLES; NANOHOLE ARRAYS; NANOHOLES; OPTICAL CHARACTERISTICS; PHOTOVOLTAIC APPLICATIONS; SELECTIVE ETCHING; SILICON SURFACES; SURFACE REFLECTIONS; THIN FILM PHOTOVOLTAIC;

ANNEALING; ETCHING; NANOPARTICLES;

SILVER;

EID: 77955822799     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3462397     Document Type: Article

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