Growth processes of lithium titanate thin films deposited by using pulsed laser deposition

Applied Physics Letters

Volumn 101, Issue 12, 2012, Pages

  Kumatani, Akichika ^a   Ohsawa, Takeo ^a   Shimizu, Ryota ^a   Takagi, Yoshitaka ^a   Shiraki, Susumu ^a   Hitosugi, Taro ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC RATIO; EPITAXIAL THIN FILMS; GROWTH PROCESS; HIGH CONDUCTIVITY; LITHIUM TITANATE; METAL OXIDE DEPOSITION; ROOM TEMPERATURE; TARGET COMPOSITION;

EPITAXIAL GROWTH; METALLIC COMPOUNDS; PULSED LASER DEPOSITION; THIN FILMS; VAPOR DEPOSITION;

LITHIUM;

EID: 84866885663     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4752466     Document Type: Article

References (29)

1. P. G. Radaelli, New J. Phys. 7, 53 (2005). 10.1088/1367-2630/7/1/053
2. G. F. Dionne, Magnetic Oxides (Springer, 2009).
3. D. C. Johnston, H. Prakash, W. H. Zachariasen, and R. Viswanathan, Mater. Res. Bull. 8, 777 (1973). 10.1016/0025-5408(73)90183-9
4. D. C. Johnston, J. Low Temp. Phys. 25, 145 (1976). 10.1007/BF00654827
5. H. Y. Hwang, Y. Iwasa, M. Kawasaki, B. Keimer, N. Nagaosa, and Y. Tokura, Nat. Mater. 11, 103 (2012). 10.1038/nmat3223
6. H. Zheng, J. Wang, S. E. Lofland, Z. Ma, L. Mohaddes-Ardabili, T. Zhao, L. Salamanca-Riba, S. R. Shinde, S. B. Ogale, F. Bai, D. Viehland, Y. Jia, D. G. Schlom, M. Wuttig, A. Roytburd, and R. Ramesh, Science 303, 661 (2004). 10.1126/science.1094207
7. M. G. Chapline and S. X. Wang, Phys. Rev. B 74, 014418 (2006). 10.1103/PhysRevB.74.014418
8. J.-P. Locquet, J. Perret, J. Fompeyrine, E. Machler, J. W. Seo, and G. Van Tendeloo, Nature (London) 394, 453 (1998). 10.1038/28810
9. I. Bozovic, G. Logvenov, I. Belca, B. Narimbetov, and I. Sveklo, Phys. Rev. Lett. 89, 107001 (2002). 10.1103/PhysRevLett.89.107001
10. Q. Y. Wang, Z. Li, W. H. Zhang, Z. C. Zhang, J. S. Zhang, W. Li, H. Ding, Y. B. Ou, P. Deng, K. Chang, J. Wen, C. L. Song, K. He, J. F. Jia, S. H. Ji, Y. Y. Wang, L. L. Wang, X. Chen, X. C. Ma, and Q. K. Xue, Chin. Phys. Lett. 29, 037402 (2012). 10.1088/0256-307X/29/3/037402
11. J. B. Bates, N. J. Dudney, B. Neudecker, A. Ueda, and C. D. Evans, Solid State Ionics 135, 33 (2000). 10.1016/S0167-2738(00)00327-1
12. R. Eason, Pulsed Laser Deposition of Thin Films (Wiley-Interscience, 2006).
13. S. Canulescu, E. L. Papadopoulou, D. Anglos, Th. Lippert, C. W. Schneider, and A. Wokaun, J. Appl. Phys. 105, 063107 (2009). 10.1063/1.3095687
14. A. Perea, J. Gonzalo, C. N. Afonso, C. Vivien, and Ch. Leborgne, Appl. Phys. A 69, S141 (1999). 10.1007/s003399900344
15. T. Ohnishi, B. T. Hang, X. Xu, M. Osada, and K. Takada, J. Mater. Res. 25, 1886 (2011). 10.1557/JMR.2010.0250
16. T. Dumont, T. Lippert, M. Dobeli, H. Grimmer, J. Ufheil, P. Novak, A. Wursig, U. Vogt, and A. Wokaun, Appl. Surf. Sci. 252, 4902 (2006). 10.1016/j.apsusc.2005.07.119
17. P. P. Edwards, R. G. Egdell, S. I. Fragala, J. B. Goodenough, M. R. Harrison, A. F. Orchard, and E. G. Scott, J. Solid State Chem. 54, 127 (1984). 10.1016/0022-4596(84)90140-3
18. JCPDF-00-005-0672.
19. JCPDF-00-040-0407.
20. JCPDF-00-049-0207.
21. JCPDF 01-088-0416.
22. T. Inukai, T. Murakami, and T. Inamura, Thin Solid Films 94, 47 (1982). 10.1016/0040-6090(82)90028-1
23. V. Bhosle, A. Tiwari, and J. Narayan, J. Appl. Phys. 97, 083539 (2005). 10.1063/1.1868852
24. T. Ohsawa, J. Okubo, T. Suzuki, H. Kumigashira, M. Oshima, and T. Hitosugi, J. Phys. Chem. C 115, 16625 (2011). 10.1021/jp203021u
25. Y. Furubayashi, T. Hitosugi, Y. Yamamoto, K. Inaba, G. Kinoda, Y. Hirose, T. Shimada, and T. Hasegawa, Appl. Phys. Lett. 86, 252101 (2005). 10.1063/1.1949728
26. T. Hitosugi, N. Yamada, S. Nakao, Y. Hirose, and T. Hasegawa, Phys. Status Solidi A 207, 1529 (2010). 10.1002/pssa.200983774
27. T. Inukai and T. Murakami, Jpn. J. Appl. Phys. 22, 61 (1983). 10.1143/JJAP.22.L61
28. T. Inukai and T. Murakami, Thin Solid Films 128, 275 (1985). 10.1016/0040-6090(85)90079-3
29. 4 epitaxial thin films.