Mechanisms of the laser plume expansion during the ablation of LiMn 2O4

Journal of Applied Physics

Volumn 105, Issue 6, 2009, Pages

  Canulescu, S ^a   Papadopoulou, E L ^b   Anglos, D ^b   Lippert, Th ^c   Schneider, C W ^c   Wokaun, A ^c  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^c PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ANGULAR RANGES; AS-GROWN FILMS; ATOMIC SPECIES; BACKGROUND PRESSURES; DEPOSITION PARAMETERS; DEPOSITION TEMPERATURES; GAS MOLECULES; GROWING FILMS; HEAVY ELEMENTS; IN VACUUMS; LASER PLUMES; LI ATOMS; LIGHT ELEMENTS; LITHIUM ATOMS; MASS RATIOS; OXYGEN ATMOSPHERES; OXYGEN PRESSURES; OXYGEN SPECIES; PLASMA PLUMES; PLUME EXPANSIONS; PRESSURE RANGES; PULSED LASER ABLATION DEPOSITIONS; SPATIAL DISTRIBUTIONS; SPECTROSCOPIC TECHNIQUES;

ANGULAR DISTRIBUTION; ATOMIC SPECTROSCOPY; ATOMS; CHEMICAL ELEMENTS; EMISSION SPECTROSCOPY; FILM GROWTH; FILMS; LASER ABLATION; LEAKAGE (FLUID); LITHIUM ALLOYS; MANGANESE; MOLECULAR SPECTROSCOPY; OPTICAL EMISSION SPECTROSCOPY; OXYGEN; PLASMA DIAGNOSTICS; PLASMAS; PULSED LASER DEPOSITION; SIZE DISTRIBUTION; THERMAL PLUMES; VACUUM;

LITHIUM;

EID: 63749110091     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3095687     Document Type: Article

References (46)

1. Y. Konishi, M. Izumi, T. Manako, M. Kasai, H. Kuwahara, M. Kawasaki, K. Terakura, and Y. Tokura, J. Phys. Soc. Jpn. 0031-9015 10.1143/JPSJ.68.3790 68, 3790 (1999).
2. M. Allegrini, F. Fuso, G. Lorenzi, L. N. Vyacheslavov, and E. Arimondo, Appl. Surf. Sci. 106, 438 (1996). 0169-4332
3. C. Julien, E. Haro-Poniatowski, M. A. Camacho-Lopez, L. Escobar-Alarcon, and J. Jimenez-Jarquin, Mater. Sci. Eng., B 0921-5107 10.1016/S0921-5107(99) 00598-X 72, 36 (2000).
4. T. Dumont, T. Lippert, M. Dobeli, H. Grimmer, J. Ufheil, P. Novak, A. Wursig, U. Vogt, and A. Wokaun, Appl. Surf. Sci. 0169-4332 10.1016/j.apsusc. 2005.07.119 252, 4902 (2006).
5. K. A. Striebel, C. Z. Deng, S. J. Wen, and E. J. Cairns, J. Electrochem. Soc. 0013-4651 10.1149/1.1836910 143, 1821 (1996).
6. C. Julien, M. A. Camacho-Lopez, L. Escobar-Alarcon, and E. Haro-Poniatowski, Mater. Chem. Phys. 0254-0584 10.1016/S0254-0584(00)00372-2 68, 210 (2001).
7. A. Perea, J. Gonzalo, C. N. Afonso, C. Vivien, and L. Ch, Appl. Phys. A: Mater. Sci. Process. 69, S141 (1999). 0947-8396
8. D. O' Mahony, J. Lunney, Th. Dumont, S. Canulescu, T. Lippert, and A. Wokaun, Appl. Surf. Sci. 254, 811 (2007). 0169-4332
9. S. Amoruso, J. Schou, and J. G. Lunney, Europhys. Lett. 0295-5075 10.1209/epl/i2006-10296-0 76, 436 (2006).
10. J. Giapintzakis, A. Sfounis, and M. Velegrakis, Int. J. Mass. Spectrom. 189, 1 (1999). 1387-3806
11. H. Dang, M. Zhou, and Q. Qin, Appl. Surf. Sci. 140, 118 (1999). 0169-4332
12. C. J. Druffner, G. P. Perram, and R. R. Biggers, Rev. Sci. Instrum. 0034-6748 10.1063/1.2018503 76, 093101 (2005).
13. S. Amoruso, A. Sambri, M. Vitiello, and X. Wang, Appl. Surf. Sci. 0169-4332 10.1016/j.apsusc.2005.07.107 252, 4712 (2006).
14. N. Arnold, J. Gruber, and J. Heitz, Appl. Phys. A: Mater. Sci. Process. 0947-8396 10.1007/s003390051360 69, S87 (1999).
15. S. Amoruso, R. Bruzzese, N. Spinelli, and R. Velotta, J. Phys. B 0953-4075 10.1088/0953-4075/32/14/201 32, R131 (1999).
16. J. G. Lunney, B. Doggett, and Y. Kaufmann, J. Phys.: Conf. Ser. 59, 470 (2007). 1742-6588
17. J. G. Lunney and B. Doggett, Proc. SPIE 0277-786X 10.1117/12.675528 6261, 62610B (2006).
18. S. I. Anisimov, B. S. Luk'yanchuk, and A. Luches, Appl. Surf. Sci. 96-98, 24 (1996). 0169-4332
19. R. K. Singh and J. Narayan, Phys. Rev. B 0163-1829 10.1103/PhysRevB.41. 8843 41, 8843 (1990).
20. P. Lecoeur, A. Gupta, P. R. Duncombe, G. Q. Gong, and G. Xiao, J. Appl. Phys. 0021-8979 10.1063/1.362756 80, 513 (1996).
21. S. Amoruso, R. Bruzzese, R. Velotta, N. Spinelli, M. Vitiello, and X. Wang, Appl. Surf. Sci. 0169-4332 10.1016/j.apsusc.2005.03.030 248, 45 (2005).
22. S. I. Anisimov, D. Bäuerle, and B. S. Luk'yanchuk, Phys. Rev. B 0163-1829 10.1103/PhysRevB.48.12076 48, 12076 (1993).
23. K. R. Chen, J. N. LeBoeuf, R. F. Wood, D. B. Geohegan, J. M. Donato, C. L. Liu, and A. A. Puretzky, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.75. 4706 75, 4706 (1995).
24. D. B. Geohegan and A. A. Puretzky, Appl. Phys. Lett. 0003-6951 10.1063/1.114665 67, 197 (1995).
25. S. Amoruso, A. Sambri, and X. Wang, J. Appl. Phys. 0021-8979 10.1063/1.2207500 100, 013302 (2006).
26. M. Tanaka, Y. Fujisawa, T. Nakajima, Y. Tasaka, K. Ota, and S. Usami, J. Appl. Phys. 0021-8979 10.1063/1.367136 83, 3379 (1998).
27. X. Hou, L. Pan, Y. Sun, Y. Li, Y. He, and H. Qi, Appl. Surf. Sci. 0169-4332 10.1016/j.apsusc.2003.12.009 227, 325 (2004).
28. S. Canulescu (unpublished).
29. NIST database, http://physics.nist.gov/PhysRefData/contents.html.
30. S. S. Harilal, C. V. Bindhu, V. P. N. Nampoori, and C. P. G. Vallabhan, Appl. Spectrosc. 0003-7028 10.1366/0003702981943671 52, 449 (1998).
31. G. Bekefi, Principles of Laser Plasmas (Wiley, New York, 1976).
32. J. A. Chaos, R. W. Dreyfus, A. Perea, R. Serna, J. Gonzalo, and C. N. Afonso, Appl. Phys. Lett. 0003-6951 10.1063/1.125847 76, 649 (2000).
33. J. B. Bates, N. J. Dudney, G. R. Gruzalski, R. A. Zuhr, A. Choudhury, C. F. Luck, and J. D. Robertson, J. Power Sources 0378-7753 10.1016/0378-7753(93) 80106-Y 43, 103 (1993).
34. R. F. Wood, K. R. Chen, J. N. Leboeuf, A. A. Puretzsky, and D. B. Geohegan, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.79.1571 79, 1571 (1997).
35. V. Berardi, S. Amoruso, N. Spinelli, M. Armenante, R. Velotta, F. Fuso, M. Allegrini, and E. Arimondo, J. Appl. Phys. 0021-8979 10.1063/1.357856 76, 8077 (1994).
36. G. G. Amatucci, J. M. Tarascon, and L. C. Klein, J. Electrochem. Soc. 0013-4651 10.1149/1.1836594 143, 1114 (1996).
37. S. Amoruso, B. Toftmann, and J. Schou, Phys. Rev. E 1063-651X 10.1103/PhysRevE.69.056403 69, 056403 (2004).
38. S. S. Harilal, C. V. Bindhu, M. S. Tillack, F. Najmabadi, and A. C. Gaeris, J. Appl. Phys. 0021-8979 10.1063/1.1544070 93, 2380 (2003).
39. T. E. Itina, J. Hermann, P. Delaporte, and M. Sentis, Phys. Rev. E 1063-651X 10.1103/PhysRevE.66.066406 66, 066406 (2002).
40. R. F. Wood, K. R. Chen, J. N. Leboeuf, A. A. Puretzsky, and D. B. Geohegan, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.79.1571 79, 1571 (1997).
41. D. B. Geohegan, in Pulsed Laser Deposition of Thin Films, edited by, D. B. Chrisey, and, G. K. Hubler, (Wiley, New York, 1994), p. 115.
42. D. B. Geohegan and D. N. Mashburn, Appl. Phys. Lett. 0003-6951 10.1063/1.102362 55, 2345 (1989).
43. S. Amoruso, R. Bruzzese, N. Spinelli, and R. Velotta, J. Phys. B 0953-4075 10.1088/0953-4075/32/14/201 32, R131 (1999).
44. D. B. Geohegan and A. A. Puretzky, Appl. Phys. Lett. 0003-6951 10.1063/1.114665 67, 197 (1995).
45. D. B. Geohegan and A. A. Puretzky, Appl. Surf. Sci. 96-98, 131 (1996). 0169-4332
46. S. J. Henley, G. M. Fuge, and M. N. R. Ashfold, J. Appl. Phys. 0021-8979 10.1063/1.1828241 97, 023304 (2005).