Wafer-scale integration of group III-V lasers on silicon using transfer printing of epitaxial layers

Nature Photonics

Volumn 6, Issue 9, 2012, Pages 610-614

  Justice, John ^a   Bower, Chris ^b   Meitl, Matthew ^b   Mooney, Marcus B ^c   Gubbins, Mark A ^c   Corbett, Brian ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b SEMPRIUS INC   (United States)

^c SEAGATE TECHNOLOGY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CONTINUOUS WAVE LASING; ELECTRONIC INDUSTRIES; FABRICATION STRATEGIES; MODULATION BANDWIDTH; MULTI-TRANSVERSE MODE; RIDGE WAVEGUIDE LASERS; SILICON ELECTRONICS; WAFER-SCALE INTEGRATION;

EPITAXIAL GROWTH; INTEGRATION; PRINTING; RIDGE WAVEGUIDES; SILICON; WSI CIRCUITS;

SILICON WAFERS;

EID: 84866389765     PISSN: 17494885     EISSN: 17494893     Source Type: Journal    
DOI: 10.1038/nphoton.2012.204     Document Type: Article

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