Synthesis of TiO 2 thin films using single molecular precursors by MOCVD method for dye-sensitized solar cells application and study on film growth mechanism

Materials Research Bulletin

Volumn 47, Issue 10, 2012, Pages 2717-2721

  Nam, Sang Hun ^a   Hyun, Jae Sung ^a   Boo, Jin Hyo ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

A. Oxides; A. Thin films; B. Vapor deposition; D. Electrical properties

Indexed keywords

ANATASE PHASE; ANATASE TIO; CRACK FREE; CRYSTALLINITIES; DEPOSITION TEMPERATURES; DIMETHYLAMIDO; DYE-SENSITIZED SOLAR CELL; FILM GROWTH MECHANISM; GROWTH DIRECTIONS; ISO-PROPOXIDE; MOCVD METHODS; POLYCRYSTALLINE THIN FILM; RUTILE PHASE; SEQUENTIAL CHANGES; SI(1 0 0); SINGLE-CRYSTALLINE; SINGLE-MOLECULAR PRECURSOR; SINGLE-SOURCE PRECURSOR; TEMPERATURE DEPENDENCE; TIO; XRD;

ACTIVATION ENERGY; AMORPHOUS FILMS; ELECTRIC PROPERTIES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDE MINERALS; PHOTOELECTROCHEMICAL CELLS; SILICON; SOLAR CELLS; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; VAPOR DEPOSITION; VAPORS;

FILM GROWTH;

EID: 84866317162     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2012.04.039     Document Type: Conference Paper

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