Wafer scale imprint uniformity evaluated by LSPR spectroscopy: A high volume characterization method for nanometer scale structures

Nanotechnology

Volumn 23, Issue 38, 2012, Pages

  Jeppesen, Claus ^a   Lindstedt, Daniel Nilsson ^b   Vig, Asger Laurberg ^b   Kristensen, Anders ^a   Asger Mortensen, N ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^b DANISH TECHNOLOGICAL INSTITUTE   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION METHODS; CRITICAL DIMENSION; CRITICAL DIMENSION METROLOGY; IMPRINTED STRUCTURES; LOCALIZED SURFACE PLASMON RESONANCE; NANOMETER SCALE STRUCTURE; OPTICAL SPECTRA; OPTICAL TRANSMISSION MEASUREMENTS; PHYSICAL STRUCTURES; SCATTEROMETRY; TERA HERTZ; WAFER SCALE;

ATOMIC FORCE MICROSCOPY; SCANNING ELECTRON MICROSCOPY;

CHARACTERIZATION;

GOLD; NANOMATERIAL;

ARTICLE; CHEMISTRY; CRYSTALLIZATION; MATERIALS TESTING; METHODOLOGY; MOLECULAR IMPRINTING; PARTICLE SIZE; SPECTROSCOPY; SURFACE PLASMON RESONANCE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; GOLD; MATERIALS TESTING; MOLECULAR IMPRINTING; NANOSTRUCTURES; PARTICLE SIZE; SPECTRUM ANALYSIS; SURFACE PLASMON RESONANCE; SURFACE PROPERTIES;

EID: 84866077866     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/38/385306     Document Type: Article

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