Silicon-based photonic crystals fabricated using proton beam writing combined with electrochemical etching method

Nanoscale Research Letters

Volumn 7, Issue , 2012, Pages 1-7

  Dang, Zhiya ^a   Breese, Mark B H ^a   Recio Sánchez, Gonzalo ^b   Azimi, Sara ^a   Song, Jiao ^a   Liang, Haidong ^a   Banas, Agnieszka ^a   Torres Costa, Vicente ^b   Martín Palma, Raúl José ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

Defect density; Photonic band structure; Proton beam writing

Indexed keywords

BAND STRUCTURE; DEFECT DENSITY; ELECTROCHEMICAL ETCHING; FABRICATION; ION BEAMS; ION BOMBARDMENT; OPTICAL LATTICES; PHOTONIC BAND GAP; POROUS SILICON; PROTON BEAMS;

2-D PHOTONIC CRYSTALS; ION BEAM IRRADIATION; PHOTONIC BAND STRUCTURES; PROTON BEAM WRITING; SILICON BASED PHOTONICS; SILICON NANO STRUCTURES; THREEDIMENSIONAL (3-D); TWO DIMENSIONAL (2 D);

SILICON PHOTONICS;

EID: 84866074836     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-7-416     Document Type: Article

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