SCOPUS 정보 검색 플랫폼

Volumn 100, Issue , 2012, Pages 12-15

Fabrication of ZrO 2 nanopatterns for biomimetic antireflection by thermal nanoimprint lithography

(10) Kim, Jae Kwan a Park, Seong Je a Kim, Sarah a Park, Hyeong Ho a,c Kim, Ki Don a Choi, Jun Hyuk a Lee, Jihye a Choi, Dae Geun a Suh, Kahp Y b Jeong, Jun Ho a

a Korea Institute of Machine and Materials (South Korea)

b Seoul National University (South Korea)

c Korea Advanced Nano Fab Center (KANC) (South Korea)

Author keywords

Antireflection; Hardness; Nanoimprint; ZrO 2

Indexed keywords

ANTI-REFLECTION; GLASS SUBSTRATES; MOTHEYE; NANO PATTERN; NANO-IMPRINT; PERFLUOROPOLYETHERS; POLYMER MOLDS; THERMAL NANOIMPRINT; THERMAL NANOIMPRINT LITHOGRAPHY; ULTRAVIOLET CURABLE; ZIRCONIUM DIOXIDE;

HARDNESS;

EID: 84865804234 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2012.07.111 Document Type: Article

Times cited : (19)

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