Cross-contamination in single-chamber processes for thin-film silicon solar cells

Journal of Non-Crystalline Solids

Volumn 358, Issue 17, 2012, Pages 2183-2186

  Woerdenweber, J ^a   Merdzhanova, T ^a   Zimmermann, T ^a   Flikweert, A J ^a   Stiebig, H ^b   Beyer, W ^a,b   Gordijn, A ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b Malibu GmbH and Co KG   (Germany)

Author keywords

Cross contamination; PECVD; Phosphorus; Single chamber process; Solar cells

Indexed keywords

A-SI:H; CELL EFFICIENCY; CHAMBER WALLS; CROSS CONTAMINATION; HIGH QUALITY; I-LAYER; INDUSTRIAL PROCESSS; P-LAYER; PROCESS CHAMBERS; SINGLE-CHAMBER PROCESS; SOFT-START; TANDEM CELLS; TANDEM SOLAR CELLS; THIN-FILM SILICON SOLAR CELLS;

BORON; CONTAMINATION; PHOSPHORUS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SOLAR CELLS;

SILICON;

EID: 84865758437     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2011.12.041     Document Type: Conference Paper

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