a-Si:H/a-Si:H stacked cell from VHF-deposition in a single chamber reactor with 9% stabilized efficiency

Solar Energy Materials and Solar Cells

Volumn 46, Issue 2, 1997, Pages 157-172

  Platz, R ^a   Fischer, D ^a   Dubail, S ^a   Shah, A ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

Deposition; Single chamber reactor; Stacked cell

Indexed keywords

AMORPHOUS SILICON; COMPOSITION EFFECTS; CONTAMINATION; DEGRADATION; DEPOSITION; ETCHING; GLOW DISCHARGES; HYDROGEN; OXYGEN; PLASMAS;

DILUTION; SINGLE CHAMBER REACTOR; STACKED CELLS; VERY HIGH FREQUENCY GLOW DISCHARGE (VHFGD) DEPOSITION;

SILICON SOLAR CELLS;

EID: 0031142256     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(97)00008-1     Document Type: Article

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