As-Received, Ozone Cleaned and Ar+ Sputtered Surfaces of Hafnium Oxide Grown by Atomic Layer Deposition and Studied by XPS

Surface Science Spectra

Volumn 18, Issue 1, 2011, Pages 46-57

  Engelhard, Mark ^a   Herman, Jacob ^a   Wallace, Robert ^b   Baer, Don ^a  

^a PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

^b The University of Texas at Dallas   (United States)

Author keywords

ALD; Atomic layer deposition; Hafnium oxide; TEMA; Tetraethylmethylaminohafnium; Thin film; X ray photoelectron spectroscopy; XPS

Indexed keywords

ALD; HYDROCARBON CONTAMINATION; PHYSICAL ELECTRONICS; PREFERENTIAL SPUTTERING; SPUTTERED SURFACES; SURFACE CONCENTRATION; TEMA; TETRAETHYLMETHYLAMINOHAFNIUM;

BINDING ENERGY; CARBIDES; DEPOSITION; HAFNIUM; HAFNIUM OXIDES; MONOLAYERS; OXIDES; OZONE; PHOTOELECTRONS; SPUTTERING; SURVEYS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION;

EID: 84865588514     PISSN: 10555269     EISSN: 15208575     Source Type: Journal    
DOI: 10.1116/11.20100601     Document Type: Article

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