Application of matrix-assisted laser desorption/ionization mass spectrometric imaging for photolithographic structuring

Analytical Chemistry

Volumn 84, Issue 16, 2012, Pages 6921-6925

  Crecelius, Anna C ^a,b   Steinacker, Ralf ^a   Meier, Alexander ^a   Alexandrov, Theodore ^c,d   Vitz, Jürgen ^a,b   Schubert, Ulrich S ^a,b  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b DUTCH POLYMER INSTITUTE DPI   (Netherlands)

^c Steinbeis Innovation Center for Scientific Computing in Life Sciences (SCiLS)   (Germany)

^d UNIVERSITY OF BREMEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE COMPONENTS; ANALYSIS OF POLYMERS; ELECTRONIC COMPONENT; GLASS SLIDES; LIFE-SCIENCES; MATRIX ASSISTED LASER DESORPTION/IONIZATION; NEGATIVE PHOTORESISTS; NOVOLAC; PHOTORESIST LAYERS; PRINTED WIRING; PROOF OF CONCEPT; TETRA-HYDROFURAN;

IMAGING TECHNIQUES; ITO GLASS; MASS SPECTROMETERS; ORGANIC SOLVENTS; PHOTORESISTS; POLYMER FILMS; SURFACE ANALYSIS;

PRINTED CIRCUIT BOARDS;

EID: 84865471824     PISSN: 00032700     EISSN: 15206882     Source Type: Journal    
DOI: 10.1021/ac301616v     Document Type: Article

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