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Volumn 41, Issue 9, 2012, Pages 2345-2349
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Effect of the surface morphology of seed and mask layers on InP grown on Si by epitaxial lateral overgrowth
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Author keywords
chemical mechanical polishing (CMP); dislocations; epitaxial lateral overgrowth (ELOG); Heteroepitaxy; hydride vapor phase epitaxy (HVPE); InP; morphology
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Indexed keywords
ALUMINUM OXIDES;
COLLOIDAL SILICA;
CRYSTAL QUALITIES;
DOUBLE LINE;
EPITAXIAL LATERAL OVERGROWTH;
HYDRIDE VAPOR PHASE EPITAXY;
IN-SITU;
INP;
MASK LAYER;
OPTICAL QUALITIES;
ROOM TEMPERATURE;
SEED LAYER;
SODIUM HYPOCHLORITES;
TWO-STEP PROCESS;
ATOMIC FORCE MICROSCOPY;
CHEMICAL MECHANICAL POLISHING;
CITRIC ACID;
COALESCENCE;
DISLOCATIONS (CRYSTALS);
HYDRIDES;
HYDROMETALLURGY;
MORPHOLOGY;
POLISHING;
SCANNING ELECTRON MICROSCOPY;
SILICA;
SILICON;
SURFACE MORPHOLOGY;
SURFACE ROUGHNESS;
VAPORS;
EPITAXIAL GROWTH;
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EID: 84865210241
PISSN: 03615235
EISSN: None
Source Type: Journal
DOI: 10.1007/s11664-012-2164-9 Document Type: Article |
Times cited : (18)
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References (16)
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