메뉴 건너뛰기




Volumn 41, Issue 9, 2012, Pages 2345-2349

Effect of the surface morphology of seed and mask layers on InP grown on Si by epitaxial lateral overgrowth

Author keywords

chemical mechanical polishing (CMP); dislocations; epitaxial lateral overgrowth (ELOG); Heteroepitaxy; hydride vapor phase epitaxy (HVPE); InP; morphology

Indexed keywords

ALUMINUM OXIDES; COLLOIDAL SILICA; CRYSTAL QUALITIES; DOUBLE LINE; EPITAXIAL LATERAL OVERGROWTH; HYDRIDE VAPOR PHASE EPITAXY; IN-SITU; INP; MASK LAYER; OPTICAL QUALITIES; ROOM TEMPERATURE; SEED LAYER; SODIUM HYPOCHLORITES; TWO-STEP PROCESS;

EID: 84865210241     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-012-2164-9     Document Type: Article
Times cited : (18)

References (16)
  • 16
    • 0011086113 scopus 로고
    • 10.1088/0022-3727/5/1/308 1:CAS:528:DyaE38Xmtleksw%3D%3D
    • K Kanaya S Okayama 1972 J. Phys. D 5 43 10.1088/0022-3727/5/1/308 1:CAS:528:DyaE38Xmtleksw%3D%3D
    • (1972) J. Phys. D , vol.5 , pp. 43
    • Kanaya, K.1    Okayama, S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.