Preparation of nanostructured silicon surface for mass spectrometry analysis by an all-wet fabrication process using electroless metal deposition and metal assisted etching

International Journal of Mass Spectrometry

Volumn 321-322, Issue , 2012, Pages 8-13

  Tsao, Chia Wen ^a   Yang, Zhi Jie ^a   Chung, Cheng Wei ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

Desorption ionization on silicon; Electroless metal deposition; Mass spectrometry; Matrix free laser desorption ionization; Metal assisted etching; Nanostructured silicon

Indexed keywords

EID: 84864419972     PISSN: 13873806     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijms.2012.05.007     Document Type: Article

References (20)

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