Dynamic modeling of superresolution photoinduced-inhibition nanolithography

Optics Express

Volumn 20, Issue 15, 2012, Pages 16871-16879

  Gan, Zongsong ^a   Cao, Yaoyu ^a   Jia, Baohua ^a   Gu, Min ^a  

^a SWINBURNE UNIVERSITY OF TECHNOLOGY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; NANOLITHOGRAPHY; OPTICAL RESOLVING POWER; POLYMERIZATION;

DOT SIZE; DYNAMICAL MODEL; HIGH RESOLUTION; INHIBITION PROCESS; SUPER RESOLUTION; TWO-PHOTON EXCITATIONS;

TWO PHOTON PROCESSES;

EID: 84864148450     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.20.016871     Document Type: Article

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